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Machine translation
1. (WO2004010229) METHOD, ARTICLE AND COMPOSITION FOR LIMITING PARTICLE AGGREGATION IN A MASK DEPOSITED BY A COLLOIDAL SUSPENSION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/010229    International Application No.:    PCT/US2000/009365
Publication Date: 29.01.2004 International Filing Date: 06.04.2000
IPC:
C23C 14/04 (2006.01), G03F 1/00 (2012.01)
Applicants: MICRON TECHNOLOGY, INC. [US/US]; 8000 South Federal Way, Boise, ID 83707 (US) (For All Designated States Except US).
WELLS, David, H. [US/US]; (US).
HOFFMAN, James, J. [US/US]; (US)
Inventors: WELLS, David, H.; (US).
HOFFMAN, James, J.; (US)
Agent: BULCHIS, Edward; Dorsey & Whitney LLP, Suite 3400, 1420 Fifth Avenue, Seattle, WA 98101 (US)
Priority Data:
Title (EN) METHOD, ARTICLE AND COMPOSITION FOR LIMITING PARTICLE AGGREGATION IN A MASK DEPOSITED BY A COLLOIDAL SUSPENSION
(FR) PROCEDE, ARTICLE ET COMPOSITION PERMETTANT DE LIMITER L'AGREGATION DE PARTICULES DANS UN MASQUE FORME PAR DEPOT D'UNE SUSPENSION COLLOIDALE
Abstract: front page image
(EN)A method, composition, and article for patterning and depositioning a substrate (12) employing a colloid suspension (10) to eliminate aggregations of colloid particles (18) in the substrate (12). The colloidal suspension (10) may include a plurality of colloidal particles (18) in a suspension medium which may comprise deionized water, a resist such as photoresist, and a solvent.
(FR)La présente invention se rapporte à un procédé, une composition et un article permettant de former par dépôt un substrat (12) et de le structurer au moyen d'une suspension colloïdale (10) afin de supprimer l'agrégation des particules colloïdales (18) dans ledit substrat (12). La suspension colloïdale (10) peut contenir une pluralité de particules colloïdales (18) en suspension dans un milieu pouvant comporter de l'eau desionisée, une réserve du type photorésine, et un solvant.
Designated States: AE, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CR, CU, CZ, DE, DK, DM, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)