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Machine translation
1. (WO2004008550) RAPID LOW-TEMPERATURE SYNTHESIS OF QUANTUM DOTS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/008550    International Application No.:    PCT/US2003/021878
Publication Date: 22.01.2004 International Filing Date: 14.07.2003
Chapter 2 Demand Filed:    30.01.2004    
IPC:
C01B 19/00 (2006.01)
Applicants: ADVANCED RESEARCH AND TECHNOLOGY INSTITUTE, INC. [US/US]; 351 West 10th Street, Indianapolis, IN 46202 (US) (For All Designated States Except US).
YOUNG, Bruce, A. [US/US]; (US) (For US Only).
NAUMANN, Christoph [DE/US]; (US) (For US Only)
Inventors: YOUNG, Bruce, A.; (US).
NAUMANN, Christoph; (US)
Agent: HASAN, Salim, A.; Leydig, Voit & Mayer, Ltd., Two Prudential Plaza, Suite 4900, 180 North Stetson, Chicago, IL 60601-6780 (US)
Priority Data:
60/395,909 15.07.2002 US
Title (EN) RAPID LOW-TEMPERATURE SYNTHESIS OF QUANTUM DOTS
(FR) SYNTHESE RAPIDE, A BASSE TEMPERATURE, DE POINTS QUANTIQUES
Abstract: front page image
(EN)The invention pertains to the rapid low-temperature synthesis of quantum dots, such as CdTe or CdSe, via thermal and sonochemical methods. The methods allow for a stable quantum dot with a coating and linker to be prepared in a single step. The methods use inexpensive, stable reagents and are easy to scale up to allow for industrial-sized quantities. The invention further provides a quantum dot prepared by such methods.
(FR)L'invention concerne la synthèse rapide, à basse température, de points quantiques, tels que CdTe ou CdSe, via des procédés thermiques et sonochimiques. Lesdits procédés permettent de préparer un point quantique stable présentant un revêtement ou un agent de liaison en une seule étape. Lesdits procédés font appel à des réactifs économiques, stables et sont faciles à mettre à l'échelle pour permettre d'obtenir des quantités industrielles. L'invention concerne également un point quantique préparé selon lesdits procédés.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)