WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2004008246) METHOD AND SYSTEM FOR CONTEXT-SPECIFIC MASK WRITING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/008246    International Application No.:    PCT/US2003/021996
Publication Date: 22.01.2004 International Filing Date: 14.07.2003
IPC:
G06F 17/50 (2006.01)
Applicants: CADENCE DESIGN SYSTEMS, INC. [US/US]; 2655 Seely Avenue, Bldg. 5, San Jose, CA 95134 (US)
Inventors: PACK, Robert, C.; (US).
SHEFFER, Louis, K.; (US)
Agent: MEI, Peter, C.; Bingham McCutchen LLP, Three Embarcadero Center, Suite 1800, San Francisco, CA 94111-4067 (US)
Priority Data:
60/395,415 12.07.2002 US
Title (EN) METHOD AND SYSTEM FOR CONTEXT-SPECIFIC MASK WRITING
(FR) PROCEDE ET SYSTEME DE GRAVURE DE MASQUE SPECIFIQUE AU CONTEXTE
Abstract: front page image
(EN)A method for generating lithography masks 118 includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask 106.
(FR)L'invention concerne un procédé destiné à produire des masques lithographiques et consistant à générer des données de conception de circuit intégré et à utiliser des informations de contexte issues de ces données de conception de circuit intégré pour graver un masque.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)