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1. (WO2004008231) DYNAMICALLY TUNABLE PHOTONIC BANDGAP MICROCAVITY WAVEGUIDES VIA MECHANICAL LATTICE CONTROL
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/008231    International Application No.:    PCT/US2003/022083
Publication Date: 22.01.2004 International Filing Date: 15.07.2003
IPC:
G02B 6/122 (2006.01), G02F 1/01 (2006.01)
Applicants: MASSACHUSETTS INSTITUTE OF TECHNOLOGY [US/US]; 77 Massachussets Avenue, Cambridge, MA 02139 (US)
Inventors: WONG, Chee, Wei; (US).
BARBASTATHIS, George; (US).
KIM, Sang-Gook; (US).
JOHNSON, Steven, G.; (US)
Agent: CONNORS, Matthew, E.; Samuels, Gauthier & Stevens LLP, 225 Franklin Street, Suite 3300, Boston, MA 02110 (US)
Priority Data:
60/395,926 15.07.2002 US
60/467,854 05.05.2003 US
10/619,203 14.07.2003 US
Title (EN) DYNAMICALLY TUNABLE PHOTONIC BANDGAP MICROCAVITY WAVEGUIDES VIA MECHANICAL LATTICE CONTROL
(FR) GUIDES D'ONDES POSSEDANT UNE MICROCAVITE A BANDE PHOTONIQUE ET POUVANT ETRE ACCORDES DYNAMIQUEMENT PAR L'INTERMEDIAIRE D'UN CONTROLE MECANIQUE DE RESEAU
Abstract: front page image
(EN)A photonic bandgap microcavity is provided. The microcavity includes a membrane structure (6) that can experience strain. A photonic bandgap waveguide element (2) is formed on the membrane structure having a defect (8) so that when the membrane structure is strained, the photonic bandgap waveguide element is tuned to a selective amount.
(FR)L'invention concerne une microcavité à bande photonique. Cette microcavité possède une structure de membrane (6) pouvant subir une contrainte. Un élément de guide d'ondes à bande photonique (2) est crée sur la structure de la membrane présentant un défaut (8), de sorte que, quand la structure de la membrane est soumise à une contrainte, l'élément de guide d'ondes est accordé en fonction d'un niveau sélectif.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)