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1. (WO2004007353) CONTINUOUS CHEMICAL VAPOR DEPOSITION PROCESS AND PROCESS FURNACE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/007353    International Application No.:    PCT/US2003/022298
Publication Date: 22.01.2004 International Filing Date: 17.07.2003
Chapter 2 Demand Filed:    03.02.2004    
IPC:
C23C 16/26 (2006.01), C23C 16/44 (2006.01), C23C 16/46 (2006.01), C23C 16/54 (2006.01)
Applicants: HITCO CARBON COMPOSITES, INC. [US/US]; 1600 W. 135th Street, Gardena, CA 90249-2506 (US)
Inventors: PRUETT, James, G.; (US).
AWASTHI, Shrikant; (US)
Agent: CURATOLO, Joseph, G.; Renner, Kenner, Greive, Bobak, Taylor & Weber, 24500 Center Ridge Road, Suite 280, Westlake, OH 44145 (US)
Priority Data:
60/396,522 17.07.2002 US
Title (EN) CONTINUOUS CHEMICAL VAPOR DEPOSITION PROCESS AND PROCESS FURNACE
(FR) PROCEDE DE DEPOT CHIMIQUE CONTINU EN PHASE VAPEUR ET FOUR CORRESPONDANT
Abstract: front page image
(EN)An apparatus and process is provided for continuously depositing solid carbon at atmospheric pressure onto the surfaces and in the porosity of a thin substrate material.
(FR)L'invention concerne un appareil et un procédé pour déposer en continu du carbone solide à pression atmosphérique sur les surfaces et dans les pores d'un matériau à substrat fin.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)