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Machine translation
1. (WO2004006283) ADJUSTABLE IMPLANTATION ANGLE WORKPIECE SUPPORT STRUCTURE FOR AN ION BEAM IMPLANTER
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/006283    International Application No.:    PCT/US2003/021527
Publication Date: 15.01.2004 International Filing Date: 10.07.2003
Chapter 2 Demand Filed:    09.02.2004    
IPC:
H01J 37/317 (2006.01), H01L 21/687 (2006.01)
Applicants: AXCELIS TECHNOLOGIES, INC. [US/US]; 55 Cherry Hill Drive, Beverly, MA 01915-1053 (US)
Inventors: FERRARA, Joseph; (US)
Agent: BURKE, Steven, D.; R.G.C. Jenkins & Co., 26 Caxton Street, London SW1H ORJ (GB)
Priority Data:
10/192,344 10.07.2002 US
Title (EN) ADJUSTABLE IMPLANTATION ANGLE WORKPIECE SUPPORT STRUCTURE FOR AN ION BEAM IMPLANTER
(FR) STRUCTURE SUPPORT DE PIECE A ANGLE D'IMPLANTATION REGLABLE POUR IMPLANTEUR D'IONS
Abstract: front page image
(EN)An ion beam implanter includes an ion beam source for generating an ion beam (14) moving along a beam line and a vacuum or implantation chamber (22) wherein a workpiece (24) is positioned to intersect the ion beam for ion implantation of a surface (25) of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure (100) coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a rotation member (110) rotatably affixed to the implantation chamber. Rotation of the rotation member with respect to the implantation chamber changes an implantation angle (A) of the workpiece with respect to the portion of the ion beam beam line within the implantation chamber. The workpiece support structure further includes a translation member movably (150) coupled to the rotation member and supporting the workpiece for linear movement along a path of travel. The translation member moves along a direction of movement such that a distance that the ion beam moves through the implantation chamber remains constant during movement of the workpiece along its path of travel.
(FR)L'invention porte sur un implanteur d'ions comprenant un générateur de faisceau d'ions (14) mobile le long de l'axe de faisceau, et une chambre (22) à vide ou d'implantation dans laquelle la pièce à traiter (24) est placée de manière à recevoir le faisceau d'ions qui dopera l'une (25) de ses surfaces. L'implanteur comporte en outre une structure support (100) de la pièce à traiter couplée à la chambre d'implantation. Ladite structure comprend: un élément (110) monté tournant dans la chambre d'implantation, et dont la rotation modifie l'angle d'implantation de la pièce à traiter par rapport à l'axe du faisceau d'ions à l'intérieur de la chambre; ainsi qu'un élément (150) mobile en translation et couplé à l'élément (110) et déplaçant linéairement la pièce à traiter sur sa trajectoire et dans une direction telle que le déplacement du faisceau dans la chambre reste constant alors que la pièce à traiter se déplace sur ladite trajectoire.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)