WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2004006014) METHOD OF USING AN AMORPHOUS CARBON LAYER FOR IMPROVED RETICLE FABRICATION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/006014    International Application No.:    PCT/US2003/020113
Publication Date: 15.01.2004 International Filing Date: 25.06.2003
Chapter 2 Demand Filed:    02.02.2004    
IPC:
G03F 1/54 (2012.01), G03F 1/76 (2012.01), H01L 21/027 (2006.01)
Applicants: ADVANCED MICRO DEVICES, INC. [US/US]; One AMD Place, Mail Stop 68, P.O. Box 3453, Sunnyvale, CA 94088-3453 (US)
Inventors: TABERY, Cyrus, E.; (US).
LYONS, Christopher, F.; (US)
Agent: COLLOPY, Daniel, R.; Advanced Micro Devices, Inc., One AMD Place, Mail Stop 68, Sunnyvale, CA 94088-3453 (US).
WRIGHT, Hugh, R.; Brookes Batchellor, 102-108 Clerkenwell Road, London EC1M 5SA (GB)
Priority Data:
10/190,138 03.07.2002 US
Title (EN) METHOD OF USING AN AMORPHOUS CARBON LAYER FOR IMPROVED RETICLE FABRICATION
(FR) UTILISATION D'UNE COUCHE DE CARBONE AMORPHE POUR FABRICATION AMELIOREE DE RETICULES
Abstract: front page image
(EN)A method of using an amorphous carbon layer (130) for improved reticle fabrication includes depositing a stack of layers including a substrate (110), an absorber (120), a transfer layer (130), an anti­reflective coating (ARC) layer (140), and a photoresist layer (150), patterning (45) the photoresist layer (150), and etching (55, 65) the ARC layer (140) and the transfer layer (130). The method also includes etching (75) the absorber layer(120) and removing (85) the transfer layer (130). The transfer layer (130) including amorphous carbon.
(FR)Cette invention concerne un procédé d'utilisation d'une couche de carbone amorphe (130) permettant d'améliorer la fabrication de réticules. Ce procédé consiste à : déposer une succession de couches dont un substrat (110), un absorbeur (120), une couche de transfert (130), une couche de revêtement anti-réfléchissant (ARC) (140), et une couche de photorésine (150) ; réaliser une structure (45) sur la couche de photorésine (150) ; et graver (55, 65) la couche ARC (140) et la couche de transfert (130). Le procédé consiste en outre à graver (75) la couche absorbante (120) et à retirer (85) la couche de transfert (130). Cette couche de transfert (130) renferme du carbone amorphe.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, OM, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)