WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2004005211) COMPOSITIONS FOR REMOVING ETCHING RESIDUE AND USE THEREOF
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/005211    International Application No.:    PCT/US2003/021402
Publication Date: 15.01.2004 International Filing Date: 10.07.2003
Chapter 2 Demand Filed:    02.02.2004    
IPC:
C09K 13/00 (2006.01)
Applicants: AIR PRODUCTS AND CHEMICALS, INC. [US/US]; 7201 Hamilton Boulevard, Allentown, PA 18195 (US) (For All Designated States Except US).
ROVITO, Roberto, John [US/US]; (US) (For US Only).
RENNIE, David, Barry [US/US]; (US) (For US Only).
DURHAM, Dana, L. [US/US]; (US) (For US Only)
Inventors: ROVITO, Roberto, John; (US).
RENNIE, David, Barry; (US).
DURHAM, Dana, L.; (US)
Agent: AMERNICK, Burton, A.; Connolly Bove Lodge & Hutz, LLP, 1990 M Street, N.W., Suite 800, Washington, DC 20036-3425 (US)
Priority Data:
10/191,060 10.07.2002 US
Title (EN) COMPOSITIONS FOR REMOVING ETCHING RESIDUE AND USE THEREOF
(FR) COMPOSITIONS D'ELIMINATION DES RESTES DE GRAVURE ET LEUR UTILISATION
Abstract: front page image
(EN)Compositions containing water, an organic dicarboxylic acid, a buffering agent and fluorine source and optionally a water miscible organic solvent are capable of removing etching residue.
(FR)L'invention concerne des compositions contenant de l'eau, un acide dicarboxylique organique, un agent tampon et une source de fluor et éventuellement un solvant organique hydrosoluble apte à éliminer les restes de gravure.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)