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1. (WO2004005205) HOT SUBSTRATE DEPOSITION OF FUSED SILICA PROCESS AND APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/005205    International Application No.:    PCT/US2002/021137
Publication Date: 15.01.2004 International Filing Date: 03.07.2002
IPC:
C03B 17/04 (2006.01), C03B 17/06 (2006.01), C03B 19/01 (2006.01), C03B 23/02 (2006.01), C03B 23/057 (2006.01), C03B 37/012 (2006.01), C03B 37/014 (2006.01)
Applicants: PHOENIX SCIENTIFIC CORPORATION [US/US]; 4952 East Encanto Street, Mesa, AZ 85205 (US)
Inventors: PANDELISEV, Kiril, A.; (US)
Agent: WRAY, James, C.; 1493 Chain Bridge Road, Suite 300, McLean, VA 22101 (US)
Priority Data:
Title (EN) HOT SUBSTRATE DEPOSITION OF FUSED SILICA PROCESS AND APPARATUS
(FR) DEPOT SUR SUBSTRAT CHAUD DE SILICE FONDUE, PROCEDE ET APPAREIL CORRESPONDANT
Abstract: front page image
(EN)A tubular substrate (11) is provided in a vacuum furnace (51). Electrical power (68) is applied to the substrate. Silica powder is injected via injectors (37) onto the substrate so as to create an optical fiber preform (43).
(FR)Un substrat tubulaire (11) est doté d'un four à vide (51). Un courant électrique (68) est appliqué sur le substrat. De la poudre de silice est injectée par des injecteurs (37) sur les substrats de manière à créer une préforme en fibres optiques (43).
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, OM, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)