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1. (WO2004004029) COATING SEPARATOR, PROCESS FOR PRODUCING THE SAME AND ELECTRICAL AND ELECTRONIC PARTS INCLUDING THE SEPARATOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/004029    International Application No.:    PCT/JP2003/008165
Publication Date: 08.01.2004 International Filing Date: 27.06.2003
IPC:
H01G 11/00 (2013.01), H01G 11/52 (2013.01), H01G 11/84 (2013.01), H01G 9/02 (2006.01), H01M 2/16 (2006.01)
Applicants: DUPONT TEIJIN ADVANCED PAPERS, LTD. [JP/JP]; 11-1, Nagata-cho 2-chome, Chiyoda-ku, Tokyo 100-6111 (JP) (For All Designated States Except US).
NARUSE, Shinji [JP/JP]; (JP) (For US Only)
Inventors: NARUSE, Shinji; (JP)
Agent: ODAJIMA, Heikichi; Odajima Patent Office, Nippon Jitensha Bldg., 9-15, Akasaka 1-chome, Minato-ku, Tokyo 107-0052 (JP)
Priority Data:
2002-189696 28.06.2002 JP
Title (EN) COATING SEPARATOR, PROCESS FOR PRODUCING THE SAME AND ELECTRICAL AND ELECTRONIC PARTS INCLUDING THE SEPARATOR
(FR) SEPARATEUR A REVETEMENT, PROCEDE DE PRODUCTION DE CE DERNIER ET COMPOSANTS ELECTRIQUES ET ELECTRONIQUES COMPRENANT CE SEPARATEUR
(JA) コーティングセパレータ、その製造方法およびそれを用いた電気電子部品
Abstract: front page image
(EN)A separator for electrical and electronic parts, comprising a coating of at least one substance selected from among ionic substances, hydroxylated substances and silicon compounds so as to exhibit satisfactory electrolyte retention.
(FR)L'invention concerne un séparateur destiné à des composants électriques et électroniques et comprenant un revêtement constitué d'au moins une substance choisie parmi des substances ioniques, des substances hydroxylées et des composés de silicium de sorte à présenter une rétention d'électrolyte satisfaisante.
(JA)本発明は、イオン性物質、水酸基含有物質及びシリコン化合物より選ばれる少なくとも1種の物質がコーティングされた、十分な電解液の保持性を有する電気電子部品用セパレータを提供するものである。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)