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1. (WO2004003407) DIAPHRAGM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/003407    International Application No.:    PCT/JP2003/008313
Publication Date: 08.01.2004 International Filing Date: 30.06.2003
Chapter 2 Demand Filed:    15.06.2004    
F16J 3/02 (2006.01)
Applicants: TAIRA, Mitsuo [JP/JP]; (JP)
Inventors: TAIRA, Mitsuo; (JP)
Agent: WATANABE, Kazutoyo; 25-8, Nakano 2-chome, Nakano-ku, Tokyo 164-0001 (JP)
Priority Data:
2002-190066 28.06.2002 JP
(JA) ダイアフラム
Abstract: front page image
(EN)A diaphragm having a gentle wave shape formed on a pressure receiving face of a partition plate of the diaphragm, where the wave shape is formed in the radial and circumferential directions of the diaphragm. Stress caused by load can be effectively relieved not only through elasticity of material, but also through deformation that is increased in proportion to pressure induced mainly by bending.
(FR)La présente invention concerne une membrane qui comprend des formes d'ondes légères formées sur la face réceptrice de pression d'une cloison de séparation de la membrane, les formes d'ondes étant formées dans les directions radiale et circonférentielle de la membrane. L'invention permet de réduire efficacement les contraintes dues à la charge, non seulement en raison de l'élasticité du matériau, mais également en raison de la déformation qui augmente proportionnellement à la pression induite principalement par la flexion.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)