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1. (WO2003099536) METHODS AND APPARATUS OF FIELD-INDUCED PRESSURE IMPRINT LITHOGRAPHY

Pub. No.:    WO/2003/099536    International Application No.:    PCT/US2003/018020
Publication Date: Fri Dec 05 00:59:59 CET 2003 International Filing Date: Wed May 28 01:59:59 CEST 2003
IPC: B29C 43/02
B29C 59/02
Applicants: CHOU, Stephen, Y.
ZHANG, Wei
Inventors: CHOU, Stephen, Y.
ZHANG, Wei
Title: METHODS AND APPARATUS OF FIELD-INDUCED PRESSURE IMPRINT LITHOGRAPHY
Abstract:
An improved method of imprint lithography involves using fluid-induced pressure from electric or magnetic fields to press a mold onto a substrate having a moldable surface. In essence, the method comprises the steps of providing a substrate having a moldable surface, providing a mold having a molding surface and pressing the molding surface and the moldable surface together by electric or magnetic fields to imprint the molding surface onto the moldable surface. The molding surface advantageously comprises a plurality of projecting features of nanoscale extent or separation, but the molding surface can also be a smooth planar surface, as for planarization. The improved method can be practiced without mechanical presses and without sealing the region between the mold and the substrate.