Search International and National Patent Collections

1. (WO2003079740) PLASMA DEVICE

Pub. No.:    WO/2003/079740    International Application No.:    PCT/JP2002/002567
Publication Date: Sep 25, 2003 International Filing Date: Mar 18, 2002
IPC: H01J 37/32
Applicants: TOKYO ELECTRON LIMITED

ISHII, Nobuo

Inventors: ISHII, Nobuo

Title: PLASMA DEVICE
Abstract:
An antenna (30) of an etching device is connected to a high frequency power source (43) via a matching box (42). A columnar conductor pillar (32) and a cylindrical conductor ring (33) are disposed in the center of a dielectric plate (12). Between the conductor pillar (32) and the conductor ring (33), four conductive wires (31A, 31B, 31C, 31D) forming generally circular loops outside the conductor ring (33) are connected in parallel to the high frequency power source (43). The loops formed by the conductive wires (31A-31D) are arranged around the conductor pillar (32) at regular intervals in a rotation-symmetric manner around the axis perpendicular to a mounting base (22). These loops (the conductive wires (31A-31D)) are disposed on the same plane with each loop surface facing the mounting base (22).