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1. (WO2003078440) BROAD-SPECTRUM CEPHEM COMPOUNDS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2003/078440    International Application No.:    PCT/JP2003/003249
Publication Date: 25.09.2003 International Filing Date: 18.03.2003
Chapter 2 Demand Filed:    11.08.2003    
IPC:
A61K 31/546 (2006.01), C07D 501/00 (2006.01)
Applicants: SHIONOGI & CO., LTD. [JP/JP]; 1-8, Doshomachi 3-chome, Chuo-ku, Osaka-shi, Osaka 541-0045 (JP) (For All Designated States Except US).
NISHITANI, Yasuhiro [JP/JP]; (JP) (For US Only).
YAMANO, Yoshinori [JP/JP]; (JP) (For US Only)
Inventors: NISHITANI, Yasuhiro; (JP).
YAMANO, Yoshinori; (JP)
Agent: YAMAUCHI, Hideaki; Shionogi & Co., Ltd. Intellectual Property Department, 12-4, Sagisu 5-chome, Fukushima-ku, Osaka-shi, Osaka 553-0002 (JP)
Priority Data:
2002-073526 18.03.2002 JP
Title (EN) BROAD-SPECTRUM CEPHEM COMPOUNDS
(FR) COMPOSES CEPHEME A LARGE SPECTRE
Abstract: front page image
(EN)Compounds represented by the general formula (I), esters of the compounds, derivatives thereof obtained through protection of amino on the 7-position thiazole ring, or pharmaceutically acceptable salts or solvates of them: (I) wherein T is S, SO, or O; X is halogeno, CN, carbamoyl which may be substituted with lower alkyl, lower alkyl, lower alkoxy, or lower alkylthio; A is substituted lower alkylene (wherein the substituent is optionally substituted mono-lower alkyl, optionally substituted lower alkylidene, or optionally substituted lower alkylene); and Z+ is an optionally substituted nitrogenous heterocyclic group having a cationic group.
(FR)L'invention concerne des composés représentés par la formule générale (I), des esters de ces composés, des dérivés correspondants obtenus par protection d'amino sur le cycle thiazole en position 7, ou des sels ou solvates pharmaceutiquement acceptables desdits composés. Dans cette formule, T est S, SO ou O, X est halogéno, CN, carbamoyle pouvant être substitué par alkyle inférieur, alkyle inférieur, alcoxy inférieur ou alkylthio inférieur, A est alkylène inférieur substitué (le substituant étant monoalkyle inférieur éventuellement substitué, alkylidène inférieur éventuellement substitué, ou alkylène inférieur éventuellement substitué), et Z+ est un groupe hétérocyclique azoté éventuellement substitué renfermant un groupe cationique.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)