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1. (WO2003078330) METHOD OF REMOVING ANIONIC METAL COMPLEX
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2003/078330    International Application No.:    PCT/JP2003/001765
Publication Date: 25.09.2003 International Filing Date: 19.02.2003
IPC:
B01J 41/04 (2006.01), C02F 1/42 (2006.01)
Applicants: ORGANO CORPORATION [JP/JP]; 2-8, Shinsuna 1-chome Koto-ku, Tokyo 136-8631 (JP) (For All Designated States Except US).
ASAKAWA, Yuji [JP/JP]; (JP) (For US Only)
Inventors: ASAKAWA, Yuji; (JP)
Agent: YOSHIDA, Kenji; 34-12, Kichijoji-honcho 1-chome Musashino-shi, Tokyo 180-0004 (JP)
Priority Data:
2002-74367 18.03.2002 JP
Title (EN) METHOD OF REMOVING ANIONIC METAL COMPLEX
(FR) PROCEDE DE SUPRESSION D'UN COMPLEXE METALLIQUE ANIONIQUE
Abstract: front page image
(EN)A solution containing an anionic metal complex (e.g., a zinc/chloride ion complex) is brought into contact with a weakly basic anion-exchange resin. The weakly basic anion-exchange resin preferably is one based on a styrene resin. Thus, the solution having a high temperature can be passed through the anion-exchange resin, and the anionic metal complex can have improved suitability for elution from the anion-exchange resin.
(FR)Selon l'invention, une solution contenant un complexe métallique anionique (par ex. un complexe ionique zinc/chlorure) est mise en contact avec une résine d'échange anionique faiblement basique. De préférence, cette résine d'échange anionique faiblement basique est à base de résine de styrène. Ainsi, la solution présentant une température élevée peut traverser la résine d'échange anionique et le complexe métallique anionique est plus facilement élué de la résine d'échange anionique.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, OM, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)