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Machine translation
1. (WO2003073478) PLASMA-RESISTANT, WELDED ALUMINUM STRUCTURES FOR USE IN SEMICONDUCTOR PROCESSING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2003/073478    International Application No.:    PCT/US2003/004801
Publication Date: 04.09.2003 International Filing Date: 13.02.2003
Chapter 2 Demand Filed:    09.09.2003    
IPC:
B23K 20/12 (2006.01), B23K 20/233 (2006.01), B23K 20/24 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; (a corporation of Delawere), P.O. Box 450A, Santa Clara, CA 95052 (US)
Inventors: THACH, Senh; (US).
SUN, Jennifer, Y.; (US).
WU, Shun, Jackson; (US).
LIN, Yixing; (US).
STOW, Clifford, C.; (US)
Agent: BERNADICOU, Michael, A.; Blakely, Sokoloff, Taylor & Zafman LLP, 12400 Wilshire Boulevard, 7th Floor, Los Angeles, CA 90025 (US)
Priority Data:
10/086,003 26.02.2002 US
Title (EN) PLASMA-RESISTANT, WELDED ALUMINUM STRUCTURES FOR USE IN SEMICONDUCTOR PROCESSING APPARATUS
(FR) STRUCTURES EN ALUMINIUM SOUDEES, RESISTANTES AU PLASMA, S'UTILISANT DANS UN APPAREIL DE TRAITEMENT DE SEMI-CONDUCTEURS
Abstract: front page image
(EN)We have discovered a method of producing a complex-shaped aluminum alloy article, where welding has been employed to form the article, where an anodized aluminum coating is produced over a surface of the article including the weld joint, and where the anodized aluminum coating is uniform, providing improved performance over that previously known in the art for welded articles exposed to a corrosive plasma environment.
(FR)L'invention porte sur un procédé de production d'un article en alliage d'aluminium de forme complexe. Ce procédé est caractérisé par le fait que l'article est obtenu par soudage, que le revêtement en aluminium anodisé est formé à la surface de l'article, y compris sur le joint de soudure, et que le revêtement en aluminium anodisé est uniforme. Ceci confère aux articles soudés exposés à un environnement de plasma corrosif une meilleure performance par rapport aux procédés antérieurs.
Designated States: CN, JP, KR, SG.
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, SE, SI, SK, TR).
Publication Language: English (EN)
Filing Language: English (EN)