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1. (WO2003061020) SCHOTTKY DIODE WITH SILVER LAYER CONTACTING THE ZnO AND Mg¿x?Zn¿1-x?O FILMS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2003/061020 International Application No.: PCT/US2002/017555
Publication Date: 24.07.2003 International Filing Date: 30.05.2002
IPC:
H01L 31/0224 (2006.01) ,H01L 31/0392 (2006.01) ,H01L 31/108 (2006.01) ,H01L 31/112 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02
Details
0224
Electrodes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
0248
characterised by their semiconductor bodies
036
characterised by their crystalline structure or particular orientation of the crystalline planes
0392
including thin films deposited on metallic or insulating substrates
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
08
in which radiation controls flow of current through the device, e.g. photoresistors
10
characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
101
Devices sensitive to infra-red, visible or ultra-violet radiation
102
characterised by only one potential barrier or surface barrier
108
the potential barrier being of the Schottky type
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
08
in which radiation controls flow of current through the device, e.g. photoresistors
10
characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
101
Devices sensitive to infra-red, visible or ultra-violet radiation
112
characterised by field-effect operation, e.g. junction field-effect photo- transistor
Applicants:
RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY [US/US]; 58 Bevier Road Piscataway, NJ 08854, US
Inventors:
LU, Yicheng; US
SHENG, Haifeng; US
MUTHUKUMAR, Sriram; US
EMANETOGLU, Nuri, William; US
ZHONG, Zian; US
Agent:
ROBINI, Garg, K. ; Hoffmann & Baron, LLP 6900 Jericho Turnpike Syosset, NY 11791, US
Priority Data:
60/344,33704.01.2002US
Title (EN) SCHOTTKY DIODE WITH SILVER LAYER CONTACTING THE ZnO AND MgxZn1-xO FILMS
(FR) DIODE SCHOTTKY POURVUE D'UNE COUCHE D'ARGENT EN CONTACT AVEC LES FILMS ZNO ET MGXZN1-XO
Abstract:
(EN) In the present invention, there is provided semiconductor devices such as a Schottky UV photodetector fabricated on n-type ZnO and MgxZn1-xO epitaxial films. The ZnO and MgxZn1-xO films are grown on R-plane sapphire substrates and the Schottky diodes are fabricated on the ZnO and MgxZn1-xO films using silver and aluminium as Schottky and ohmic contact metals, respectively. The Schottky diodes have circular patterns, where the inner circle is the Schottky contact, and the outside ring is the ohmic contact. Ag Schottky contact patterns are fabricated using standard liftoff techniques, while the Al ohmic contact patterns are formed using wet chemical etching. These detectors show low frequency photoresponsivity, high speed photoresponse, lower leakage current and low noise performance as compared to their photoconductive counterparts. This invention is also applicable to optical modulators, Metal Semiconductor Field Effect Transistor (MESFETs) and more.
(FR) La présente invention concerne des dispositifs à semi-conducteurs, par exemple un photodétecteur d'UV de Schottky fabriqué sur des films épitaxiaux de type n ZnO et MgxZn1-xO. Les films ZnO et MgxZn1-xO sont positionnés sur des substrats de saphir à plan R et les diodes Schottky sont fabriquées sur les films ZnO et MgxZn1-xO avec de l'argent et de l'aluminium utilisés respectivement en tant que métaux de contact Schottky et ohmique. Les diodes Schottky présentent des motifs circulaires, le cercle intérieur constituant le contact Schottky, et l'anneau extérieur constituant le contact ohmique. Les motifs de contact Schottky d'argent sont fabriqués à l'aide de techniques de décollement classiques, alors que les motifs de contact ohmique d'aluminium sont formés par gravure humide. Ces détecteurs présentent une photosensibilité à faible fréquence, une photoréponse à grande vitesse, un courant de fuite inférieur et une efficacité à moindre bruit par rapport à leurs homologues photoconducteurs. Cette invention s'applique également aux modulateurs optiques, aux transistors à effet de champ métal-semiconducteur (MESFETs), et à d'autres dispositifs semblables.
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)