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1. (WO2003003429) PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM AND METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2003/003429 International Application No.: PCT/JP2002/005878
Publication Date: 09.01.2003 International Filing Date: 12.06.2002
Chapter 2 Demand Filed: 11.12.2002
IPC:
G02B 13/24 (2006.01) ,G02B 17/08 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13
Optical objectives specially designed for the purposes specified below
24
for reproducing or copying at short object distances
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17
Systems with reflecting surfaces, with or without refracting elements
08
Catadioptric systems
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
NIKON CORPORATION [JP/JP]; 2-3, Marunouchi 3-chome Chiyoda-ku, Tokyo 100-8331, JP
Inventors:
OMURA, Yasuhiro; JP
SHIRAISHI, Naomasa; JP
TANAKA, Issei; JP
OWA, Soichi; JP
OZAWA, Toshihiko; JP
NIISAKA, Shunsuke; JP
Agent:
YAMAGUCHI, Takao; Daiichi Bldg., 10, Kanda-tsukasacho 2-chome Chiyoda-ku, Tokyo 101-0048, JP
Priority Data:
2001-19612328.06.2001JP
2001-24332010.08.2001JP
Title (EN) PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM AND METHOD
(FR) SYSTEME DE PROJECTION OPTIQUE, SYSTEME D'EXPOSITION ET PROCEDE
Abstract:
(EN) A projection optical system having a good optical performance without being substantially affected by double refraction even if an optical material having an intrinsic double refraction such as fluorite is used. An projection optical system (400) for forming the reduction image of a first plane (R) onto a second plane (W), comprising a first−group light transmitting member formed to provide an approximate agreement of a crystal axis [100] with an optical axis, and a second−group light transmitting member formed to provide an approximate agreement of a crystal axis [100] with an optical axis. The first−group and second−group light transmitting members are so positionally related that one is rotated 45° from the other around the optical axis, and they are both disposed on an optical path between a pupil position (20) on the second plane side and the second plane.
(FR) L'invention concerne un système de projection optique possédant une bonne performance optique sans être sensiblement affecté par une biréfringence même lorsqu'on utilise un matériau optique à biréfringence intrinsèque tel que la fluorine. Ledit système de projection (400) optique utilisé pour former une réduction d'image d'un premier plan (R) sur un second plan (W) comprend un élément d'émission lumineuse d'un premier groupe formé de façon à fournir une concordance approximative entre un axe de cristal (100) et un axe optique, et un élément d'émission lumineuse d'un second groupe formé de façon à fournir une concordance approximative entre un axe de cristal (100) et un axe optique. Les éléments d'émission lumineuse des premier et second groupes sont positionnellement associés de sorte que lorsque l'un d'eux tourne de 45° autour de l'axe optique par rapport à l'autre, ils sont tous deux disposés sur un chemin optique entre une position de la pupille (20) sur le côté du second plan et ledit second plan.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, OM, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)