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Machine translation
1. (WO2003002688) PROCESS FOR REMOVING CONTAMINANT FROM A SURFACE AND COMPOSITION USEFUL THEREFOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2003/002688    International Application No.:    PCT/US2002/019034
Publication Date: 09.01.2003 International Filing Date: 17.06.2002
Chapter 2 Demand Filed:    17.01.2003    
IPC:
C09K 13/00 (2006.01), C11D 7/26 (2006.01), C11D 11/00 (2006.01), C23G 1/10 (2006.01), H01L 21/321 (2006.01)
Applicants: ASHLAND INC. [US/US]; P.O. Box 2219, Columbus, OH 43216 (US)
Inventors: KNEER, Emil, A.; (US)
Agent: CONAUGHTON, Martin; Ashland Inc., P.O. Box 2219, Columbus, OH 43216 (US)
Priority Data:
09/893,968 29.06.2001 US
Title (EN) PROCESS FOR REMOVING CONTAMINANT FROM A SURFACE AND COMPOSITION USEFUL THEREFOR
(FR) PROCEDE PERMETTANT D'EXTRAIRE UN CONTAMINANT D'UNE SURFACE ET COMPOSITION UTILE A CET EGARD
Abstract: front page image
(EN)Particulate and metal ion contamination is removed from a surface, such as a semiconductor wafer containing copper damascene or dual damascene features, employing a fluoride-free aqueous composition comprising a dicarboxylic acid and/or salt thereof; and a hydroxycarboxylic acid and/or salt thereof or amine group containing acid.
(FR)Pour éliminer des particules et des ions métalliques d'une surface, par exemple de la surface d'une tranche de semi-conducteur avec damasquinage de cuivre ou double damasquinage, on utilise une composition aqueuse sans fluor comprenant un acide dicarboxylique et/ou un sel de cet acide, ou bien un acide renfermant un groupe amine.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, OM, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)