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1. (WO2003002540) CYCLIC DIAMINE COMPOUND HAVING FIVE−MEMBERED CYCLIC GROUP
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2003/002540 International Application No.: PCT/JP2002/006488
Publication Date: 09.01.2003 International Filing Date: 27.06.2002
Chapter 2 Demand Filed: 22.10.2002
IPC:
C07D 231/12 (2006.01) ,C07D 233/54 (2006.01) ,C07D 261/08 (2006.01) ,C07D 263/32 (2006.01) ,C07D 277/28 (2006.01) ,C07D 277/46 (2006.01) ,C07D 333/20 (2006.01) ,C07D 401/14 (2006.01) ,C07D 403/14 (2006.01) ,C07D 409/14 (2006.01) ,C07D 413/14 (2006.01) ,C07D 417/14 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
231
Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
02
not condensed with other rings
10
having two or three double bonds between ring members or between ring members and non-ring members
12
with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
233
Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
54
having two double bonds between ring members or between ring members and non-ring members
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
261
Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings
02
not condensed with other rings
06
having two or more double bonds between ring members or between ring members and non-ring members
08
with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
263
Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
02
not condensed with other rings
30
having two or three double bonds between ring members or between ring members and non-ring members
32
with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
277
Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
02
not condensed with other rings
20
having two or three double bonds between ring members or between ring members and non-ring members
22
with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
28
Radicals substituted by nitrogen atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
277
Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
02
not condensed with other rings
20
having two or three double bonds between ring members or between ring members and non-ring members
32
with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
38
Nitrogen atoms
44
Acylated amino or imino radicals
46
by carboxylic acids, or sulfur or nitrogen analogues thereof
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
333
Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
02
not condensed with other rings
04
not substituted on the ring sulfur atom
06
with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
14
Radicals substituted by singly bound hetero atoms other than halogen
20
by nitrogen atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
401
Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
14
containing three or more hetero rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
403
Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/167
14
containing three or more hetero rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
409
Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
14
containing three or more hetero rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
413
Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
14
containing three or more hetero rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
417
Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/196
14
containing three or more hetero rings
Applicants: KOWA CO., LTD.[JP/JP]; 6-29, NISHIKI 3-CHOME, NAKA-KU NAGOYA-SHI, Aichi 460-8625, JP
Inventors: KODAMA, Tatsuhiko; JP
TAMURA, Masahiro; JP
ODA, Toshiaki; JP
YAMAZAKI, Yukiyoshi; JP
NISHIKAWA, Masahiro; JP
DOI, Takeshi; JP
KYOTANI, Yoshinori; JP
Agent: THE PATENT CORPORATE BODY ARUGA PATENT OFFICE; KYODO BLDG., 3-6, NIHONBASHININGYOCHO 1-CHOME CHUO-KU, Tokyo 103-0013, JP
Priority Data:
09/893,68229.06.2001US
Title (EN) CYCLIC DIAMINE COMPOUND HAVING FIVE−MEMBERED CYCLIC GROUP
(FR) COMPOSE DIAMINE CYCLIQUE PRESENTANT UN GROUPE CYCLIQUE A CINQ ELEMENTS
Abstract:
(EN) A compound represented by the following general formula (1): (1) (wherein A represents a single bond, C ≡ C, CONH, or NHCO; W represents carbon or nitrogen; X represents CH, nitrogen, oxygen, or sulfur; Y represents CH, CHR1, nitrogen, oxygen, sulfur, or NR2; Z represents nitrogen, oxygen, sulfur, CH, or NR3; m is 1 or 2; n is a number of 1 to 5; and R1, R2, and R3 each represents hydrogen, lower alkyl, lower alkyl substituted by hydroxy, lower alkyl substituted by lower alkoxy, aryl, lower alkyl substituted by aryl, or lower alkyl substituted by heteroaryl; provided that one or two of W, X, Y, and Z are heteroatoms), an acid addition salt of the compound, or a hydrate of either; and a medicine containing any of these. The compound (1) has inhibitory activity against cell adhesion and cell infiltration. It is useful for allergy, asthma, rheumatism, arteriosclerosis, inflammation, etc.
(FR) L'invention concerne un composé représenté par la formule générale suivante (1), (dans laquelle A représente une liaison simple ; C = C, CONH ou NHCO : W représente carbone ou azote ; X représente CH, azote, oxygène ou soufre ;Y représente CH, CHR1, azote, oxygène, soufre ou NR2 ; Z représente azote, oxygène, soufre, CH ou NR3 ; m est 1 ou 2 ; n est un nombre entre 1 et 5 et R1, R2 et R3 représentent chacun hydrogène, alkyle inférieur, alkyle inférieur substitué par hydroxy, alkyle inférieur substitué par alcoxy inférieur, aryle, alkyle inférieur substitué par aryle ou alkyle inférieur substitué par hétéroaryle, à condition qu'un ou deux éléments parmi W, X, Y et Z sont des hétéroatomes), un sel d'addition acide dudit composé, ou un hydrate du composé ou de son sel, ainsi qu'un médicament contenant ce composé ou son sel. Ledit composé (1), qui présente une activité inhibitrice contre l'adhésion cellulaire et l'infiltration cellulaire, peut être utilisé contre l'allergie, l'asthme, le rhumatisme, l'artériosclérose, l'inflammation, etc.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, OM, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)