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1. (WO2003002473) HIGH PURITY SYNTHETIC VITREOUS SILICA PARTICLES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2003/002473    International Application No.:    PCT/JP2002/006504
Publication Date: 09.01.2003 International Filing Date: 27.06.2002
Chapter 2 Demand Filed:    11.11.2002    
IPC:
C03B 19/10 (2006.01), C03C 1/00 (2006.01), C03C 1/02 (2006.01), C03C 3/06 (2006.01), C03C 12/00 (2006.01)
Applicants: M. WATANABE & CO., LTD. [JP/JP]; 2-16, Nihonbashi-muromachi 4-chome, Chuo-ku, Tokyo 103-0022 (JP) (For All Designated States Except US).
ASAHI DENKA KOGYO KABUSHIKI KAISHA [JP/JP]; 2-35, Higashiogu 7-chome, Arakawa-ku, Tokyo 116-0012 (JP) (For All Designated States Except US).
KUSUHARA, Masaki [JP/JP]; (JP) (For US Only).
WATANABE, Hiroyuki [JP/JP]; (JP) (For US Only).
UEHARA, Hirofumi [JP/JP]; (JP) (For US Only).
SANPEI, Keiko [JP/JP]; (JP) (For US Only).
KURITA, Naoyasu [JP/JP]; (JP) (For US Only).
TADA, Shuichi [JP/JP]; (JP) (For US Only).
OMI, Jinichi [JP/JP]; (JP) (For US Only).
TAKAHASHI, Makio [JP/JP]; (JP) (For US Only).
MORITA, Hiroshi [JP/JP]; (JP) (For US Only)
Inventors: KUSUHARA, Masaki; (JP).
WATANABE, Hiroyuki; (JP).
UEHARA, Hirofumi; (JP).
SANPEI, Keiko; (JP).
KURITA, Naoyasu; (JP).
TADA, Shuichi; (JP).
OMI, Jinichi; (JP).
TAKAHASHI, Makio; (JP).
MORITA, Hiroshi; (JP)
Agent: HONDA, Ichiro; No.201, Kanda Chuo Building, 2F, 5-7, Nishikanda 2-chome, Chiyoda-ku, Tokyo 101-0065 (JP)
Priority Data:
2001-195407 27.06.2001 JP
Title (EN) HIGH PURITY SYNTHETIC VITREOUS SILICA PARTICLES
(FR) PARTICULES DE SILICE VITREUSE SYNTHETIQUE DE GRANDE PURETE
Abstract: front page image
(EN)High purity synthetic vitreous silica particles, characterized in that it is derived from an alkali metal silicate and has a total metal impurity content of 1 μg/g or less, and in particular has an oxygen deficient defect. The melt of the high purity synthetic vitreous silica particles exhibits a high viscosity similar to that of the melt of natural quartz, and the above synthetic vitreous silica has a high purity similar to that of a conventional synthetic quartz and can be produced at a reduced cost.
(FR)L'invention concerne des particules de silice vitreuse synthétique de grande pureté, caractérisées en ce qu'elle sont dérivées d'un silicate de métal alcalin et présentent une teneur totale en impuretés métalliques ne dépassant pas 1 $g(m)g/g. La fonte de ces particules de silice vitreuse synthétique de grande pureté présente une viscosité élevée, similaire à celle du quartz naturel ; cette silice vitreuse synthétique présente une grande pureté, similaire à celle d'un quartz synthétique classique, et peut être produite à moindre coût.
Designated States: CN, KR, US.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)