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Machine translation
1. (WO2003001297) METHOD FOR DETERMINING LITHOGRAPHIC FOCUS AND EXPOSURE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2003/001297    International Application No.:    PCT/US2002/020876
Publication Date: 03.01.2003 International Filing Date: 26.06.2002
IPC:
G03F 7/20 (2006.01)
Applicants: KLA-TENCOR CORPORATION [US/US]; 160 Rio Robles San Jose, CA 95134 (US)
Inventors: MIEHER, Walter, Dean; (US).
DZIURA, Thaddeus, Gerard; (US).
LEVY, Ady; (US).
MACK, Chris; (US)
Agent: OLYNICK, Mary, R.; BEYER WEAVER & THOMAS, LLP 2030 Addison Street 7th Floor P.O. Box 778 Berkeley, CA 94704 (US)
Priority Data:
60/301,270 26.06.2001 US
60/361,837 04.03.2002 US
  24.06.2002 US
Title (EN) METHOD FOR DETERMINING LITHOGRAPHIC FOCUS AND EXPOSURE
(FR) PROCEDE DE DETERMINATION DE LA FOCALISATION ET DE L'EXPOSITION LITHOGRAPHIQUES
Abstract: front page image
(EN)The invention relates to a method for determining process parameter settings of a photolithographic system. The method includes correlating the values of a first set of one or more shape parametres (12) with the values of a first set of one or more process parameters. The method also includes determining the values of a second set of one or more shape parameters associated with one or more structures (14). The method further includes determining the values of a second set of one or more process parameters associated with forming the one or more structures by comparing the second set of one or more shape parameters with the correlated dependencies (16).
(FR)L'invention concerne un procédé permettant de déterminer au moins un réglage des paramètres d'un système photolithographique.
Designated States: JP.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR).
Publication Language: English (EN)
Filing Language: English (EN)