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1. (WO2002086190) METHOD FOR PREPARING THIN POROUS LAYERS OF INORGANIC OXIDES
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2002/086190 International Application No.: PCT/ES2002/000193
Publication Date: 31.10.2002 International Filing Date: 18.04.2002
IPC:
B01D 71/02 (2006.01) ,C23C 16/40 (2006.01) ,C23C 16/44 (2006.01) ,C23C 16/50 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
71
Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
02
Inorganic material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
40
Oxides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
50
using electric discharges
Applicants:
CONSEJO SUPERIOR DE INVESTIGACIONES CIENTÍFICAS [ES/ES]; C/Serrano, 117 E-28006 Madrid, ES (AllExceptUS)
UNIVERSIDAD DE SEVILLA [ES/ES]; C/Valparaiso, 5 - 3º E-41013 Sevilla, ES (AllExceptUS)
BARRANCO QUERO, Angel [ES/ES]; ES (UsOnly)
YUBERO VALENCIA, Francisco [ES/ES]; ES (UsOnly)
ESPINOS MANZORRO, Juan Pedro [ES/ES]; ES (UsOnly)
RODRÍGUEZ GONZALEZ-ELIPE, Agustín [ES/ES]; ES (UsOnly)
COTRINO BAUTISTA, José [ES/ES]; ES (UsOnly)
Inventors:
BARRANCO QUERO, Angel; ES
YUBERO VALENCIA, Francisco; ES
ESPINOS MANZORRO, Juan Pedro; ES
RODRÍGUEZ GONZALEZ-ELIPE, Agustín; ES
COTRINO BAUTISTA, José; ES
Agent:
REPRESA SÁNCHEZ, Domingo; Oficina de Transferencia de Tecnología Consejo Superior de Investigaciones Científicas C/Serrano, 113 - 2 planta E-28006 Madrid, ES
Priority Data:
P 20010091119.04.2001ES
Title (EN) METHOD FOR PREPARING THIN POROUS LAYERS OF INORGANIC OXIDES
(ES) PROCEDIMIENTO PARA LA PREPARACIÓN DE CAPAS FINAS POROSAS DE ÓXIDOS INORGÁNICOS
(FR) PROCEDE DE PREPARATION DE FINES COUCHES POREUSES D'OXYDES INORGANIQUES
Abstract:
(EN) The invention relates to a method for preparing thin layers of inorganic oxides on substrates by means of plasma-assisted vapour phase deposition. The inventive method is different from other common methods in that organic layer deposition steps are included between the successive inorganic oxide deposition steps such that, during the inorganic layer deposition step, the previously-deposited organic part is eliminated by combustion. Said method is suitable for developing selective membranes that are used to separate and purify fluids and to produce and modify sensors for gases and humidity and electronic components.
(ES) El objeto de la presente invención es un procedimiento para la preparación de capas finas de óxidos inorgánicos sobre substratos mediante la deposición desde fase vapor asistida por plasma que se diferencia de los procedimientos habituales porque se intercalan entre las sucesivas etapas de deposición del óxido inorgánico etapas de deposición de capas orgánicas, de forma que durante la etapa de deposición de la capa inorgánica se produzca la eliminación por combustión de la parte orgánica previamente depositada. El procedimiento es de interés en el desarrollo de membranas selectivas para separación y purificación de fluidos así como para la fabricación y modificación de sensores de gases y de humedad y de componentes electrónicos.
(FR) L'invention concerne un procédé de préparation de fines couches d'oxydes inorganiques sur des substrats par déposition en phase vapeur assistée par plasma, se différenciant des procédés habituels par des étapes de déposition de couches organiques intercalées entre les étapes successives de déposition de l'oxyde inorganique, de manière qu'au cours de l'étape de déposition de la couche inorganique se produise l'élimination par combustion de la partie organique déposée au préalable. Le procédé de l'invention s'utilise dans la mise au point de membranes sélectives pour la séparation et la purification de fluides ainsi que pour la fabrication et la modification de capteurs de gaz et d'humidité et de composants électroniques.
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, OM, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Spanish (ES)
Filing Language: Spanish (ES)
Also published as:
AU2002255016