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1. WO2002039097 - MONITORING OF FILM CHARACTERISTICS DURING PLASMA-BASED SEMICONDUCTOR PROCESSING USING OPTICAL EMISSION SPECTROSCOPY

Publication Number WO/2002/039097
Publication Date 16.05.2002
International Application No. PCT/US2001/048227
International Filing Date 30.10.2001
Chapter 2 Demand Filed 31.05.2002
IPC
G01N 21/71 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
71thermally excited
CPC
G01N 21/71
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
71thermally excited
Applicants
  • APPLIED MATERIALS, INC. [US]/[US]
Inventors
  • OLUSEYI, Hakeem
  • SARFATY, Moshe
Agents
  • BERNADICOU, Michael, A.
Priority Data
09/708,25807.11.2000US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MONITORING OF FILM CHARACTERISTICS DURING PLASMA-BASED SEMICONDUCTOR PROCESSING USING OPTICAL EMISSION SPECTROSCOPY
(FR) CONTROLE DE CARACTERISTIQUES DE COUCHES MINCES LORS DU TRAITEMENT DE SEMI-CONDUCTEURS A BASE DE PLASMA PAR SPECTROSCOPIE D'EMISSION OPTIQUE
Abstract
(EN)
A method and system to monitor characteristics of films by sensing the spectral emissions of a plasma to which the films are exposed. As a result, the method includes sensing optical energy produced by the plasma. The optical energy has a plurality of spectral bands associated therewith, a subset of which is identified as including information corresponding to the film characteristics. The film characteristics are then measured as a function of this information. To increase the accuracy of the measurements, in one embodiment of the present invention a subgroup of the plurality of spectral bands is observed that has data associated that is substantially independent of the characteristics of interest. The characteristics are then measured as a function of both the information and the data.
(FR)
L'invention concerne un procédé et un système destinés à contrôler des caractéristiques de couches minces par détection des émissions spectrales d'un plasma auxquelles les couches minces sont exposées. Par conséquent, le procédé consiste à détecter l'énergie optique produite par le plasma. L'énergie optique comprend une pluralité de bandes spectrales associées, dont un sous-ensemble est identifié comme comportant des informations correspondant aux caractéristiques de couches minces. Ces caractéristiques de couches minces sont ensuite mesurées en fonction de ces informations. Afin d'augmenter la précision de ces mesures, on observe, dans un mode de réalisation de la présente invention, un sous-groupe de la pluralité de bandes spectrales, qui comporte des données associées sensiblement indépendantes des caractéristiques d'intérêt. Les caractéristiques sont ensuite mesurées en fonction à la fois des informations et des données.
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