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1. WO2002037185 - PHOTOSENSITIVE RESIN COMPOSITION

Publication Number WO/2002/037185
Publication Date 10.05.2002
International Application No. PCT/JP2001/008924
International Filing Date 11.10.2001
IPC
G03F 7/022 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
022Quinonediazides
CPC
G03F 7/022
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
022Quinonediazides
Applicants
  • CLARIANT INTERNATIONAL LTD. [CH]/[CH] (AllExceptUS)
  • TAKAHASHI, Shuichi [JP]/[JP] (UsOnly)
  • IKEMOTO, Jun [JP]/[JP] (UsOnly)
  • SHIODA, Hidekazu [JP]/[JP] (UsOnly)
  • KAWATO, Shunji [JP]/[JP] (UsOnly)
Inventors
  • TAKAHASHI, Shuichi
  • IKEMOTO, Jun
  • SHIODA, Hidekazu
  • KAWATO, Shunji
Agents
  • KANAO, Hiroki
Priority Data
2000-33181131.10.2000JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PHOTOSENSITIVE RESIN COMPOSITION
(FR) COMPOSITION DE RESINE PHOTOSENSIBLE
Abstract
(EN)
A photosensitive resin composition containing an alkali- soluble resin and a photosensitive agent containing a quinoneazide group, characterized in that the photosensitive agent comprises a mixture of two or more esters from tetrahydroxybenzophenone and 1,2-naphthoquinonediazide sulfonic acid, which esters have different average degrees of esterification. The photosensitive agent preferably comprises a photosensitive agent (A) which is an ester from tetrahydroxybenzophenone and 1,2-naphthoquinonediazide-5-sulfonic acid having an average degree of esterification of X % (50 $m(F) X $m(F) 100) and a photosensitive agent (B) which is an ester from the same components as those in the case of (A) having an average degree of esterification of Y % (25 $m(F) Y $m(F) (X - 10)), in a A:B mixing ratio of 10 to 90 : 90 to 10.
(FR)
La présente invention concerne une composition de résine photosensible contenant une résine soluble dans les alcali et un agent photosensible contenant un groupe quinoneazide. La composition se caractérise en ce que l"agent photosensible comprend un mélange d"au moins deux esters issus de la tétrahydroxybenzophénone et de l"acide 1,2-naphthoquinonediazide sulfonique, lesdits esters ayant différents degrés d"estérification moyens. L"agent photosensible comprend de préférence un agent photosensible (A) qui est un ester issu de la tétrahydroxybenzophénone et de l"acide 1,2-naphthoquinonediazide-5-sulfonique ayant un degré d"estérification moyen de X % (50 $m(F) X $m(F) 100), et un agent photosensible (B) qui est un ester issu des mêmes composés que ceux mentionnés en (A), ayant un degré d"estérification moyen de Y % (25 $m(F) Y $m(F) (X 10)), avec un rapport A:B dans le mélange valant 10 à 90: 90 à 10.
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