WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2002033369) APPARATUS FOR MEASURING TEMPERATURES OF A WAFER USING SPECULAR REFLECTION SPECTROSCOPY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/033369    International Application No.:    PCT/US2001/027767
Publication Date: 25.04.2002 International Filing Date: 12.10.2001
Chapter 2 Demand Filed:    08.05.2002    
IPC:
G01K 11/00 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; TBS Broadcast Center, 3-6, Akasaka 5-chome, Minato-ku, Tokyo 107 (JP) (For All Designated States Except US).
JOHNSON, Shane, R. [CA/US]; (US) (For US Only).
ZHANG, Yong-Hang [US/US]; (US) (For US Only).
JOHNSON, Wayne, L. [US/US]; (US) (For US Only)
Inventors: JOHNSON, Shane, R.; (US).
ZHANG, Yong-Hang; (US).
JOHNSON, Wayne, L.; (US)
Agent: WEIHROUCH, Steven, P.; Oblon, Spivak, McClelland, Maier & Neustadt, P.C., 1940 Duke Street, Alexandria, VA 22314 (US)
Priority Data:
60/239,922 13.10.2000 US
Title (EN) APPARATUS FOR MEASURING TEMPERATURES OF A WAFER USING SPECULAR REFLECTION SPECTROSCOPY
(FR) APPAREIL DE MESURE DE TEMPERATURE DE PLAQUETTE PAR SPECTROSCOPIE A REFLEXION SPECULAIRE
Abstract: front page image
(EN)An apparatus (295) using specular reflection spectroscopy to measure a temperature of a substrate (135). By reflecting light (100) from a substrate, the temperature of the substrate can be determined using the band-edge characteristics of the substrate. This in situ apparatus can be used as a feedback control in combination with a variable temperature substrate holder to more accurately control the processing conditions of the substrate. By utilizing a multiplicity of measurement sites, the variation of the temperature across the substrate can also be measured.
(FR)L'invention concerne un appareil (295) de spectroscopie à réflexion spéculaire pour la mesure de la température d'un substrat (135). La réflexion de la lumière (100) par le substrat permet de déterminer la température du substrat sur la base des caractéristiques en bordure de bande de ce substrat. Il s'agit d'un appareil in situ utilisable pour le contrôle rétroactif en combinaison avec un support de substrat à température variable, ce qui permet d'améliorer la précision du contrôle des conditions de traitement du substrat. En multipliant les sites de mesure, on peut également mesurer les écarts de température sur le substrat.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)