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Machine translation
1. (WO2002033014) METHOD OF POLISHING A MEMORY OR RIGID DISK WITH AN AMMONIA AND/OR HALIDE-CONTAINING COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/033014    International Application No.:    PCT/US2001/042231
Publication Date: 25.04.2002 International Filing Date: 20.09.2001
Chapter 2 Demand Filed:    10.05.2002    
IPC:
C09G 1/02 (2006.01), C23F 3/00 (2006.01), G11B 5/84 (2006.01)
Applicants: CABOT MICROELECTRONICS CORPORATION [US/US]; 870 North Commons Drive Aurora, IL 60504 (US)
Inventors: FANG, Mingming; (US)
Agent: TURNER-BRIM, Phyllis, T.; Law Department Cabot Microelectronics Corporation 870 North Commons Drive Aurora, IL 60504 (US)
Priority Data:
09/690,585 17.10.2000 US
Title (EN) METHOD OF POLISHING A MEMORY OR RIGID DISK WITH AN AMMONIA AND/OR HALIDE-CONTAINING COMPOSITION
(FR) PROCEDE DE POLISSAGE D'UNE MEMOIRE OU D'UN DISQUE RIGIDE A L'AIDE D'UNE COMPOSITION CONTENANT DE L'AMMONIAQUE ET/OU UN HALOGENURE
Abstract: front page image
(EN)A method for planarizing or polishing a memory or rigid disk is provided. The method comprises abrading at least a portion of the surface with a polishing system comprising (i) a polishing composition comprising water, an oxidizing agent, and a complexing agent selected from the group consisting of ammonia, halide ions, and mixtures thereof, and (ii) a polishing pad and/or an abrasive.
(FR)L'invention concerne un procédé de planarisation ou de polissage d'une mémoire ou d'un disque rigide. Ledit procédé consiste à procéder à l'abrasion d'au moins une partie de la surface à l'aide d'un système de polissage comprenant (i) une composition de polissage contenant de l'eau, un agent oxydant, et un agent complexant sélectionné dans le groupe comprenant l'ammoniaque, des ions d'halogénure, et des mélanges de ceux-ci, et (ii) un tampon de polissage et/ou un abrasif.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)