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Machine translation
1. (WO2002029496) RESIST STRIPPING PROCESS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/029496    International Application No.:    PCT/US2001/030923
Publication Date: 11.04.2002 International Filing Date: 03.10.2001
Chapter 2 Demand Filed:    07.06.2002    
IPC:
G03F 7/42 (2006.01), H05K 3/00 (2006.01)
Applicants: ENTHONE, INC. [US/US]; 193 Marshall Hill Road Orange, CT 06477 (US)
Inventors: YAKOBSON, Eric; (US)
Agent: MIRABITO, A., Jason; Mintz, Levin, Cohn, Ferris, Glovsky and Popeo,P.C. One Financial Center Boston, MA 02111 (US)
Priority Data:
09/678,465 03.10.2000 US
Title (EN) RESIST STRIPPING PROCESS
(FR) PROCEDE DE DECAPAGE DU RESIST
Abstract: front page image
(EN)A process for removing patterned negative working resist from the surface of a substrate during manufacture of printed wiring boards is disclosed. The process includes the steps of contacting the patterned resist with a stripping solution containing an alkalinity source as well as a source of ammonium ions. The stripping solution is characterized in that it does not contain volatile organic compounds (VOCs).
(FR)L'invention concerne un procédé permettant de retirer le résist de travail négatif à motifs de la surface d'un substrat pendant la fabrication de cartes imprimées. Ce procédé consiste à mettre en contact le résist à motifs avec une solution de décapage contenant une source d'alcalinité ainsi qu'une source d'ions d'ammonium. Cette solution de décapage se caractérise en ce qu'elle ne contient aucun composant organique volatile (VOC).
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)