WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2002027755) CHAMBER CONFIGURATION FOR CONFINING A PLASMA
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/027755    International Application No.:    PCT/US2001/030098
Publication Date: 04.04.2002 International Filing Date: 25.09.2001
Chapter 2 Demand Filed:    13.04.2002    
IPC:
H01J 37/32 (2006.01)
Applicants: LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway, Fremont, CA 94538 (US) (For All Designated States Except US).
CHEN, Jian, J. [CN/US]; (US) (For US Only).
SRINIVASAN, Mukund [IN/US]; (US) (For US Only).
LENZ, Eric, H. [US/US]; (US) (For US Only)
Inventors: CHEN, Jian, J.; (US).
SRINIVASAN, Mukund; (US).
LENZ, Eric, H.; (US)
Agent: OLYNICK, Mary, R.; Beyer Weaver & Thomas, LLP, P.O. Box 778, Berkeley, CA 94704-0778 (US)
Priority Data:
09/676,269 28.09.2000 US
Title (EN) CHAMBER CONFIGURATION FOR CONFINING A PLASMA
(FR) CONFIGURATION D'UNE CHAMBRE DESTINEE AU CONFINEMENT DE PLASMA
Abstract: front page image
(EN)A plasma confining assembly for minimizing unwanted plasma formations in regions outside of a process region in a process chamber is disclosed. The plasma confining assembly includes a first confining element and second confining element positioned proximate the periphery of the process region. The second confining element is spaced apart from the first confining element. The first confining element includes an exposed conductive surface that is electrically grounded and the second confining element includes an exposed insulating surface, which is configured for covering a conductive portion that is electrically grounded. The first confining element and the second confining element substantially reduce the effects of plasma forming components that pass therebetween. Additionally, the plasma confining assembly may include a third confining element, which is formed from an insulating material and disposed between the first confining element and the second confining element, and proximate the periphery of the process region. The third confining element further reduces the effects of plasma forming components that pass between the first confining element and the second confining element.
(FR)L'invention concerne un ensemble de confinement de plasma, destiné à minimiser les formations de plasma indésirables dans des zones extérieures à la zone de traitement dans une chambre de traitement. L'ensemble de confinement de plasma comprend un premier élément de confinement et un deuxième élément de confinement, disposés à proximité de la périphérie de la zone de traitement, le deuxième élément de confinement étant séparé du premier. Le premier élément de confinement comporte une surface conductrice nue, mise à la terre. Le deuxième élément de confinement comprend une surface isolante nue, conçue pour recouvrir une partie conductrice mise à la terre. Ces premier et deuxième éléments de confinement réduisent sensiblement les effets des composants constituant le plasma et passant entre eux. En outre, cet ensemble de confinement de plasma peut comporter un troisième élément de confinement, constitué d'un matériau isolant et logé entre les premier et deuxième éléments de confinement, à proximité de la périphérie de la zone de traitement. Ce troisième élément de confinement diminue davantage les effets des composants constituant le plasma, passant entre le premier et le deuxième élément de confinement.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)