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Machine translation
1. (WO2002027413) IMPROVED CLEANING BRUSH AND METHOD FOR REMOVING CONTAMINATES FROM A PHOTOCONDUCTOR FILM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/027413    International Application No.:    PCT/US2001/025244
Publication Date: 04.04.2002 International Filing Date: 10.08.2001
IPC:
G03G 21/00 (2006.01)
Applicants: HEIDELBERG DIGITAL L.L.C. [US/US]; 2600 Manitou Road Rochester, NY 14624 (US) (For All Designated States Except US).
JONES, Kurt, E. [US/US]; (US) (For US Only).
FISHER, Douglas, D. [US/US]; (US) (For US Only)
Inventors: JONES, Kurt, E.; (US).
FISHER, Douglas, D.; (US)
Agent: SCOTT, F., Lindsey; Law Office of F. Lindsey Scott 2329 Coit Road, Suite B Plano, TX 75075 (US)
Priority Data:
09/669,710 26.09.2000 US
Title (EN) IMPROVED CLEANING BRUSH AND METHOD FOR REMOVING CONTAMINATES FROM A PHOTOCONDUCTOR FILM
(FR) AMELIORATIONS APPORTEES A UNE BROSSE DE NETTOYAGE ET A UN PROCEDE PERMETTANT D'ENLEVER DES IMPURETES PRESENTES SUR UN FILM PHOTOCONDUCTEUR
Abstract: front page image
(EN)A method and a cleaning brush (26) for removing contaminants from and extending the life of photoconductor film wherein the brush has end sections (40) having a reduced coefficient of friction with the end sections of the photoconductor film which are less frequently used.
(FR)L'invention concerne un procédé et une brosse de nettoyage (26) permettant d'enlever des impuretés présentes sur un film photoconducteur et de prolonger ainsi la durée de vie de ce dernier. Ladite brosse comporte des extrémités (40) présentant un coefficient de frottement réduit avec les extrémités du film photoconducteur utilisées moins fréquemment.
Designated States: AE, AG, AL, AM, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CN, CO, CR, CU, CZ, DM, DZ, EC, EE, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KR, KZ, LC, LK, LR, LS, LT, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, RO, RU, SD, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)