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1. (WO2002027058) POROUS GETTER DEVICES WITH REDUCED PARTICLE LOSS AND METHOD FOR THEIR MANUFACTURE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/027058    International Application No.:    PCT/IT2001/000488
Publication Date: 04.04.2002 International Filing Date: 25.09.2001
Chapter 2 Demand Filed:    21.03.2002    
IPC:
B22F 3/11 (2006.01), C22C 1/04 (2006.01), C23C 14/16 (2006.01), H01J 7/18 (2006.01)
Applicants: SAES GETTERS S.P.A. [IT/IT]; Viale Italia, 77 I-20020 Lainate (IT) (For All Designated States Except US).
CONTE, Andrea [IT/IT]; (IT) (For US Only).
MORAJA, Marco [IT/IT]; (IT) (For US Only)
Inventors: CONTE, Andrea; (IT).
MORAJA, Marco; (IT)
Agent: ADORNO, Silvano; Società Italiana Brevetti S.p.A. Via Carducci, 8 I-20123 Milano (IT)
Priority Data:
MI2000A002099 27.09.2000 IT
Title (EN) POROUS GETTER DEVICES WITH REDUCED PARTICLE LOSS AND METHOD FOR THEIR MANUFACTURE
(FR) DISPOSITIFS POREUX D'ABSORPTION DE GAZ A PERTE DE PARTICULES REDUITE ET LEUR PROCEDE DE FABRICATION
Abstract: front page image
(EN)A method for reducing the loss of particles form the surface of porous getter bodies, consisting in producing on this surface a thin layer (20) of a metal or metal alloy with a deposition technique selected among evaporation, deposition from arc generated plasma , deposition form ionic beam and cathodic deposition.
(FR)La présente invention concerne un procédé de réduction de perte de particules de la surface d'éléments poreux d'absorption, qui consiste à réaliser sur ladite surface un film (30) métallique ou d'alliage métallique mince par une technique de dépôt choisie parmi l'évaporation, le dépôt par plasma-arc, le dépôt par faisceau d'ions ou le dépôt cathodique.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PH, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)