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1. (WO2002026627) NEW ZEOLITE COMPOSITIONS OF HIGH ALUMINUM HEXAGONAL FAUJASITE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/026627    International Application No.:    PCT/US2001/028966
Publication Date: 04.04.2002 International Filing Date: 17.09.2001
Chapter 2 Demand Filed:    19.04.2002    
IPC:
C01B 39/20 (2006.01)
Applicants: ENGELHARD CORPORATION [US/US]; 101 Wood Avenue P.O. Box 770 Iselin, NJ 08830-0770 (US)
Inventors: KUZNICKI, Steven, M.; (US).
LANGNER, Tadeusz, W.; (US).
JACUBINAS, Richard, M.; (US).
BELL, Valerie, A.; (US)
Agent: MILLER, Stephen, I.; Engelhard Corporation 101 Wood Avenue P.O. Box 770 Iselin, NJ 08830-0770 (US)
Priority Data:
09/669,506 25.09.2000 US
Title (EN) NEW ZEOLITE COMPOSITIONS OF HIGH ALUMINUM HEXAGONAL FAUJASITE
(FR) NOUVELLES COMPOSITIONS ZEOLITHES DE FAUJASITE HEXAGONALE A FORTE TENEUR EN ALUMINIUM
Abstract: front page image
(EN)The present invention is directed to novel, low silica hexagonal faujasites including substantially pure hexagonal polymorphs, as well as mixed intergrowths of cubic and hexagonal faujasite having a majority of hexagonal polymorph. The hexagonal faujasites can be prepared with Si/Al ratios of less than or equal to about 1.2. The hexagonal faujasites may be prepared according to a novel, simplified method by crystallizing faujasites from a highly alkaline solution containing an excess of silica.
(FR)La présente invention concerne des faujasites hexagonales à faible teneur en silice, renfermant des polymorphes sensiblement purs ainsi que des intercroissances mélangés de faujasite cubique et hexagonale comportant une majorité de polymorphe hexagonal. Les faujasites hexagonales peuvent être obtenues dans des rapports Si/Al inférieurs ou égaux à environ 1.2., ceci par un procédé nouveau et simplifié consistant à cristalliser des faujasites à partir d'une solution fortement alcaline contenant un excédent de silice.
Designated States: AE, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)