Processing

Please wait...

Settings

Settings

Goto Application

1. WO2002023960 - ELECTRODE FOR GLOW-DISCHARGE ATMOSPHERIC PLASMA TREATMENT

Publication Number WO/2002/023960
Publication Date 21.03.2002
International Application No. PCT/US2001/042079
International Filing Date 06.09.2001
Chapter 2 Demand Filed 04.04.2002
IPC
H01J 37/32 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
H05H 1/24 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1Generating plasma; Handling plasma
24Generating plasma
CPC
H01J 37/32009
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
H01J 37/3244
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
3244Gas supply means
H01J 37/32449
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
3244Gas supply means
32449Gas control, e.g. control of the gas flow
H01J 37/32532
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32532Electrodes
H05H 1/2406
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
1Generating plasma; Handling plasma
24Generating plasma
2406Dielectric barrier discharges
H05H 1/2418
Applicants
  • SIGMA TECHNOLOGIES INTERNATIONAL, INC. [US]/[US]
Inventors
  • YIALIZIS, Angelo
  • DECKER, Wolfgang
  • MIKHAEL, Michael, G.
  • PIRZADA, Shahid, A.
Agents
  • DURANDO, Antonio, R.
Priority Data
09/660,00312.09.2000US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) ELECTRODE FOR GLOW-DISCHARGE ATMOSPHERIC PLASMA TREATMENT
(FR) ELECTRODE POUR TRAITEMENT AU PLASMA ATMOSPHERIQUE A DECHARGE LUMINESCENTE
Abstract
(EN)
A porous metallic layer (46) is incorporated in one of the electrodes (36) of a plasma treatment system. A plasma gas is injected into the electrode at substantially atmospheric pressure and allowed to diffuse through the porous layer (46), thereby forming a uniform glow-discharge plasma. The film material (54) to be treated is exposed to the plasma created between this electrode and a second electrode (34) covered by a dielectric layer. A steady-state glow-discharge plasma is produced at atmospheric pressure and at power frequencies as low a 60 Hz. According to another aspect of the invention, vapor deposition is carried out in combination with plasma treatment by vaporizing a substance of interest, mixing it with the plasma gas, and diffusing the mixture through the porous electrode.
(FR)
Selon la présente invention, une couche métallique poreuse (46) est incorporée à l'une des électrodes (36) d'un système de traitement au plasma. Un gaz plasma est injecté dans l'électrode à une pression sensiblement égale à la pression atmosphérique, le gaz pouvant passer à travers la couche poreuse (46), ce qui provoque la formation d'un plasma de décharge luminescente homogène. Le matériau en film (54) à traiter est exposé au plasma produit entre cette électrode et une seconde électrode (34) recouverte d'une couche diélectrique. Un plasma de décharge luminescente stable est produit à pression atmosphérique et à des fréquences d'alimentation aussi faibles que 60 Hz. Dans un autre aspect de l'invention, le dépôt en phase vapeur est réalisé en combinaison avec le traitement au plasma grâce à la vaporisation d'une substance d'intérêt, à son mélange avec le gaz plasma, et à la diffusion du mélange à travers l'électrode poreuse.
Latest bibliographic data on file with the International Bureau