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1. WO2002023845 - METHOD FOR IMPROVING IMAGE QUALITY AND FOR INCREASING WRITING SPEED DURING EXPOSURE OF LIGHT-SENSITIVE LAYERS

Publication Number WO/2002/023845
Publication Date 21.03.2002
International Application No. PCT/DE2001/003518
International Filing Date 11.09.2001
Chapter 2 Demand Filed 11.04.2002
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70291
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70283Masks or their effects on the imaging process, e.g. Fourier masks, greyscale masks, holographic masks, phase shift masks, phasemasks, lenticular masks, multiple masks, tilted masks, tandem masks
70291Addressable masks
G03F 7/70466
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70425Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning
70466Multiple exposures, e.g. combination of fine and coarse exposures, double patterning, multiple exposures for printing a single feature, mix-and-match
G03F 7/70558
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
7055Exposure light control, in all parts of the microlithographic apparatus, e.g. pulse length control, light interruption
70558Dose control, i.e. achievement of a desired dose
Applicants
  • FRAUNHOFER GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. [DE]/[DE] (AllExceptUS)
  • PAUFLER, Jörg [DE]/[DE] (UsOnly)
  • BRUNN, Stefan [DE]/[DE] (UsOnly)
  • KÖRNER, Tim [DE]/[DE] (UsOnly)
Inventors
  • PAUFLER, Jörg
  • BRUNN, Stefan
  • KÖRNER, Tim
Agents
  • GROSS, Felix
Priority Data
100 46 518.815.09.2000DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) VERFAHREN ZUR VERBESSERUNG DER BILDQUALITÄT UND ZUR ERHÖHUNG DER SCHREIBGESCHWINDIGKEIT BEI BELICHTUNG LICHTEMPFINDLICHER SCHICHTEN
(EN) METHOD FOR IMPROVING IMAGE QUALITY AND FOR INCREASING WRITING SPEED DURING EXPOSURE OF LIGHT-SENSITIVE LAYERS
(FR) PROCEDE PERMETTANT D'AMELIORER LA QUALITE D'UNE IMAGE ET D'AUGMENTER LA VITESSE D'ECRITURE PAR EXPOSITION A LA LUMIERE DE COUCHES PHOTOSENSIBLES
Abstract
(DE)
Die Erfindung betrifft ein Verfahren für die maskenlose Belichtung zur Strukturierung lichtempfindlicher Schichten auf einem Objekt.Erfindungsgemäß wird zur Ausbildung von Strukturelementen auf der lichtempfindlichen Schicht mittels einer Lichtquelle ein als Flächenlichtmodulator wirkendes veränderliches bildgebendes Element mit zugehöriger Optik mit einer vorgegebenen Belichtungsdosis (Nominalbelichtungsdosis) bestrahlt. Entsprechend der von dem bildgenden Element aufgrund seines jeweiligen Ansteuerungszustandes erzeugter Bildfelder werden einzelne Strukturelemente, Gruppen von Strukturelementen oder Teile davon auf der lichtempfindlichen Schicht abgebildet, wobei die Nominalbelichtungsdosis auf mehrere Belichtungsvorgänge aufgeteilt und die Belichtungsdosis für die einzelnen Belichtungsvorgänge so gewählt wird, dass sie ausgehend von einer vorgegebenen minimalen Belichtungsdosis bei jedem Belichtungsvorgang gegenüber dem jeweils vorhergehenden erhöht wird, wobei sie beim letzten Belichtungsvorgang mehr als 50 % der Nominalbelichtungsdosis beträgt.
(EN)
The invention relates to a method for exposure without a mask for structuring light-sensitive layers on an object. According to the invention, structural elements are configured on the light-sensitive layer using a light source by irradiating a variable image-forming element with a corresponding lens system to a predetermined exposure dose (nominal exposure dose), said image-forming element functioning as a surface light modulator. Individual structural elements, groups of structural elements or parts thereof are reproduced on the light-sensitive layer according to the image fields generated by the image-forming element as a result of its respective control state, the nominal exposure dose being divided between several exposure operations and the exposure dose for the individual exposure operations being chosen in such a way that starting from a predetermined minimum exposure dose, the exposure dose is increased for each exposure operation compared to the one before. The exposure dose for the last exposure process is more than 50 % of the nominal exposure dose.
(FR)
L'invention concerne un procédé permettant l'exposition à la lumière, sans masque, pour la structuration de couches photosensibles sur un objet. Conformément à l'invention, en vue de former des éléments de structure sur la couche photosensible au moyen d'une source lumineuse, on expose à un rayonnement, à une dose d'exposition à la lumière prédéterminée (dose d'exposition nominale), au moyen d'une optique correspondante, un élément modifiable formant l'image, agissant comme modulateur de lumière en surface. Suivant les champs image produits par l'élément formant l'image, consécutivement à son état de commande respectif, des éléments de structure individuels, des groupes d'éléments de structure ou des parties de ceux-ci sont reproduits sur la couche photosensible, la dose d'exposition nominale étant répartie sur plusieurs processus d'exposition ; en outre, la dose d'exposition pour les processus individuels est choisie de manière à augmenter à partir d'une dose d'exposition minimale prédéterminée pour chaque processus, par rapport au précédent, si bien qu'elle s'élève, pour le dernier processus d'exposition, à plus de 50 % de la dose d'exposition nominale.
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