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1. WO2002019376 - SYSTEM AND METHOD FOR REMOVING CONTAMINANT PARTICLES RELATIVE TO AN ION BEAM

Publication Number WO/2002/019376
Publication Date 07.03.2002
International Application No. PCT/GB2001/003709
International Filing Date 17.08.2001
Chapter 2 Demand Filed 28.03.2002
IPC
H01J 37/02 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
H01J 37/30 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
H01J 37/317 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
CPC
H01J 2237/004
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
004Charge control of objects or beams
H01J 2237/022
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
02Details
022Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
H01J 2237/31705
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
30Electron or ion beam tubes for processing objects
317Processing objects on a microscale
31701Ion implantation
31705Impurity or contaminant control
H01J 37/026
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
026Means for avoiding or neutralising unwanted electrical charges on tube components
H01J 37/3002
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
3002Details
H01J 37/3171
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
3171for ion implantation
Applicants
  • AXCELIS TECHNOLOGIES, INC. [US]/[US]
  • EATON LIMITED [GB]/[GB] (CA)
Inventors
  • BENVENISTE, Victor, Maurice
  • GRAF, Michael, Anthony
  • HARRINGTON, Eric, Ryan
  • RATHMELL, Robert, Day
Agents
  • BURKE, Steven, D.
Priority Data
09/654,37901.09.2000US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) SYSTEM AND METHOD FOR REMOVING CONTAMINANT PARTICLES RELATIVE TO AN ION BEAM
(FR) SYSTEME ET PROCEDE PERMETTANT DE SUPPRIMER DES PARTICULES CONTAMINANTES ASSOCIEES A UN FAISCEAU IONIQUE
Abstract
(EN)
A system for inhibiting the transport of contaminant particles with an ion beam (16) includes a particle charging system (12) for charging particles within a region through which the ion beam travels. An electric field (50) is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel (18) for the ion beam (16).
(FR)
L'invention concerne un système permettant d'inhiber le transport de particules contaminantes associées à un faisceau ionique (16), qui comprend un système de chargement de particules (12) permettant de charger des particules dans une région à travers laquelle ledit faisceau ionique circule. Un champ électrique (50) est produit en aval de la région chargée afin de forcer les particules chargées à s'éloigner d'un sens de déplacement (18) dudit faisceau ionique (16).
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