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1. (WO2002008347) RESIST INK COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/008347    International Application No.:    PCT/JP2001/006309
Publication Date: 31.01.2002 International Filing Date: 19.07.2001
IPC:
G03F 7/038 (2006.01), H05K 1/00 (2006.01), H05K 3/28 (2006.01)
Applicants: SHOWA DENKO K. K. [JP/JP]; 13-9, Shiba Daimon 1-chome Minato-ku, Tokyo 105-8518 (JP) (For All Designated States Except US).
WATANABE, Takeo [JP/JP]; (JP) (For US Only).
SATO, Takashi [JP/JP]; (JP) (For US Only).
TAGOSHI, Hirotaka [JP/JP]; (JP) (For US Only)
Inventors: WATANABE, Takeo; (JP).
SATO, Takashi; (JP).
TAGOSHI, Hirotaka; (JP)
Agent: ISHIDA, Takashi; A. AOKI, ISHIDA & ASSOCIATES Toranomon 37 Mori Bldg., 5-1, Toranomon 3-chome Minato-ku, Tokyo 105-8423 (JP)
Priority Data:
2000-219997 21.07.2000 JP
60/246,596 08.11.2000 US
Title (EN) RESIST INK COMPOSITION
(FR) COMPOSITION D'ENCRE DE RÉSERVE
Abstract: front page image
(EN)The present invention provides a resist ink composition comprising a compound (a) having at least one oxetanyl group and at least one epoxy group within the same molecule and a compound (b) capable of initiating cationic polymerization under irradiation by an active energy ray and/or under heat. This resist ink composition has high photosensitivity and enables the final curing by a brief heating and the cured film exhibits good physical properties.
(FR)La présente invention concerne une composition d'encre de réserve comprenant un composé (a) qui comporte un au moins un groupe oxétanyle et au moins un groupe époxy dans la même molécule, et un composé (b) capable de déclencher une polymérisation cationique lorsqu'il est irradié par un rayon d'énergie active et/ou de la chaleur. Cette composition d'encre de réserve se caractérise par une photosensibilité élevée et un durcissement final obtenue après un rapide chauffage, le film durci possédant de bonnes propriétés physiques.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)