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Machine translation
1. (WO2002007925) METHOD AND APPARATUS FOR REMOVAL OF MINUTE PARTICLES FROM A SURFACE USING THERMOPHORESIS TO PREVENT PARTICLE REDEPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/007925    International Application No.:    PCT/US2001/021112
Publication Date: 31.01.2002 International Filing Date: 24.07.2001
Chapter 2 Demand Filed:    28.01.2002    
IPC:
B08B 7/00 (2006.01), G03F 1/00 (2012.01), H01L 21/306 (2006.01)
Applicants: FLORIDA STATE UNIVERSITY RESEARCH FOUNDATION [US/US]; 2035 East Paul Dirac Drive P.O. Box 15 Tallahassee, FL 32310 (US) (For All Designated States Except US).
ALLEN, Susan, D. [US/US]; (US) (For US Only)
Inventors: ALLEN, Susan, D.; (US)
Agent: FLESHNER, Mark, L.; P.O. Box 221200 Chantilly, VA 20153-1200 (US)
Priority Data:
60/220,418 24.07.2000 US
09/909,993 23.07.2001 US
09/909,992 23.07.2001 US
Title (EN) METHOD AND APPARATUS FOR REMOVAL OF MINUTE PARTICLES FROM A SURFACE USING THERMOPHORESIS TO PREVENT PARTICLE REDEPOSITION
(FR) PROCEDE ET DISPOSITIF PERMETTANT D'ELIMINER DES PARTICULES DE TRES PETITE TAILLE D'UNE SURFACE AU MOYEN D'UNE THERMOPHORESE DE MANIERE A EMPECHER LA REDEPOSITION DES PARTICULES
Abstract: front page image
(EN)A method and apparatus for removing minute particles (22) from a surface (21) of a sample (20) are provided that prevent redeposition of the particles (22) onto the surface (21). By combining thermophoresis with laser assisted particle removal (LAPR), the methods and apparatus remove minute particles (for example, micrometer and nanometer sizes) and assure that they will not redeposit.
(FR)L'invention concerne un procédé et un dispositif permettant d'éliminer des particules (22) de très petite taille de la surface (21) d'un échantillon (20) et empêchant la redéposition des particules (22) sur cette surface (21). Par la combinaison de la thermophorèse avec l'élimination de particules par laser, ces procédés et ce dispositif permettent d'éliminer les particules de très petite taille (p. ex. de dimensions micrométriques ou nanométriques) et d'assurer qu'elles ne se redéposent pas.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)