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1. WO2002005147 - INTEGRATED CIRCUIT DESIGN CORRECTION USING FRAGMENT CORRESPONDENCE

Publication Number WO/2002/005147
Publication Date 17.01.2002
International Application No. PCT/US2001/041299
International Filing Date 06.07.2001
Chapter 2 Demand Filed 07.02.2002
IPC
G03F 1/00 2012.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
CPC
G03F 1/36
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
36Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
Applicants
  • MENTOR GRAPHICS CORPORATION [US]/[US]
Inventors
  • SAHOURIA, Emile
Agents
  • MENDONSA, Paul, A.
Priority Data
09/613,21310.07.2000US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) INTEGRATED CIRCUIT DESIGN CORRECTION USING FRAGMENT CORRESPONDENCE
(FR) CORRECTION DE CONCEPTION DE CIRCUITS INTEGRES UTILISANT UNE CORRESPONDANCE DE FRAGMENTS
Abstract
(EN) Layout correction is accomplished using a forward mapping technique. Forward mapping refers to mapping fragments from a reticle (1210) to a target layout (1280).
(FR) Une correction de dessin est mise en oeuvre à l'aide d'une technique d'application avant. L'application avant désigne l'application de fragments d'un réticule (1210) à un dessin (1280) voulu.
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