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Machine translation
1. (WO2002005030) CONTROL TECHNIQUE FOR MICROLITHOGRAPHY LASERS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/005030    International Application No.:    PCT/US2001/005239
Publication Date: 17.01.2002 International Filing Date: 14.02.2001
Chapter 2 Demand Filed:    24.08.2001    
IPC:
G03F 7/20 (2006.01), H01S 3/102 (2006.01), H01S 3/13 (2006.01)
Applicants: CYMER, INC. [US/US]; 16750 Via del Campo Court San Diego, CA 92127-1712 (US) (For All Designated States Except US).
ZAMBON, Paolo [IT/US]; (US) (For US Only).
PADMABANDU, Gamaralalage, G. [LK/US]; (US) (For US Only).
WATSON, Tom, A. [US/US]; (US) (For US Only).
DAS, Palash, P. [US/US]; (US) (For US Only)
Inventors: ZAMBON, Paolo; (US).
PADMABANDU, Gamaralalage, G.; (US).
WATSON, Tom, A.; (US).
DAS, Palash, P.; (US)
Agent: ROSS, John, R.; Cymer, Inc. Legal Department-MS/1-2A 16750 Via Del Campo Court San Diego, CA 92127-1712 (US)
Priority Data:
09/515,974 29.02.2000 US
Title (EN) CONTROL TECHNIQUE FOR MICROLITHOGRAPHY LASERS
(FR) TECHNIQUE DE COMMANDE DESTINEE AU LASER DE MICROLITHOGRAPHIE
Abstract: front page image
(EN)A lithograph quality optimization process for controlling laser beam parameters when changing operating modes. The laser is programmed to automatically conduct an optimization procedure preferably in less than one minute to adjust laser operating parameters such as blower speed, total gas pressure and F2 partial pressure in order to optimize beam quality parameters.
(FR)L'invention concerne un procédé d'optimisation de la qualité lithographique permettant de commander les paramètres du faisceau laser lors du changement de modes de fonctionnement. Le laser est programmé pour effectuer de manière automatique une procédure d'optimisation, de préférence en moins d'une minute, en vue d'adapter les paramètres de fonctionnement du laser, tels que la vitesse de la soufflante, la pression totale du gaz et la pression partielle F2, afin d'optimiser les paramètres de la qualité du faisceau.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)