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1. (WO2002003139) PHASE-SHIFT LITHOGRAPHY MAPPING METHOD AND APPARATUS

Pub. No.:    WO/2002/003139    International Application No.:    PCT/US2001/020929
Publication Date: Jan 10, 2002 International Filing Date: Jun 29, 2001
IPC: G03F 1/30
G06F 17/50
Applicants: AVANT CORPORATION
Inventors: MAYHEW, Jeffrey, P.
Title: PHASE-SHIFT LITHOGRAPHY MAPPING METHOD AND APPARATUS
Abstract:
For phase-shifting microlithography, a method of assigning phase to a set of shifter polygons [101] in a mask layer separated by a set of target features [102] includes assigning a first phase to a first shifter polygon [110, 140], identifying a set of target features that touch the first shifter polygon [120, 130], and assigning a second phase to all shifter polygons in the set that touch the set of target features in contact with the first shifter polygon [145, 150, 155]. The set of shifter polygons and the set of target features are separated into aggregates that are spatially isolated from each other such that the phase assignment in one aggregate [191] does not affect the phase assignments in other aggregates [192].