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Machine translation
1. (WO2002001613) METHOD AND APPARATUS FOR WAFER CLEANING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/001613    International Application No.:    PCT/US2001/020466
Publication Date: 03.01.2002 International Filing Date: 26.06.2001
Chapter 2 Demand Filed:    25.01.2002    
IPC:
B08B 3/02 (2006.01), B08B 3/12 (2006.01), H01L 21/00 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; P.O. Box 450A Santa Clara, CA 95052 (US)
Inventors: VERHAVERBEKE, Steven; (US).
TRUMAN, J., Kelly; (US).
KO, Alexander; (US).
ENDO, Rick, R.; (US)
Agent: BERNADICOU, Michael, A.; Blakely, Sokoloff, Taylor & Zafman LLP 7th floor 12400 Wilshire Boulevard Los Angeles, CA 90025 (US)
Priority Data:
09/603,792 26.06.2000 US
09/891,849 25.06.2001 US
Title (EN) METHOD AND APPARATUS FOR WAFER CLEANING
(FR) PROCEDE ET APPAREIL POUR NETTOYER DES TRANCHES DE SILICIUM
Abstract: front page image
(EN)An apparatus for wet processing individual wafers comprising: a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.
(FR)L'invention concerne un appareil pour traiter par voie humide des tranches de silicium individuelles, comprenant un moyen pour tenir la tranche, un moyen pour fournir de l'énergie acoustique à une face de la tranche ne comportant pas de dispositifs, et un moyen pour faire couler un fluide sur la face de la tranche comportant des dispositifs.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)