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1. WO2002001296 - STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS

Publication Number WO/2002/001296
Publication Date 03.01.2002
International Application No. PCT/US2001/020657
International Filing Date 28.06.2001
Chapter 2 Demand Filed 28.01.2002
IPC
G03F 7/004 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/039 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
CPC
G03F 7/0045
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
0045with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
G03F 7/0392
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
0392the macromolecular compound being present in a chemically amplified positive photoresist composition
Applicants
  • INFINEON TECHNOLOGIES NORTH AMERICA CORP. [US]/[US]
Inventors
  • LU, Ahijian
  • GUTMAN, Alois
Agents
  • BRADEN, Stanton, C.
  • EPPING HERMANN & FISCHER
Priority Data
09/605,57128.06.2000US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS
(FR) COMPOSITIONS DE RESINE DE GENERATEUR D'ACIDE PHOTOSENSIBLE FORTEMENT HYDROSOLUBLES
Abstract
(EN) A chemically amplified resist composition that eliminates blob defects when used to produce semiconductor devices comprising: a base polymer with a protected group; a solvent; and a photoacid generator comprising an iodonium salt containing a water-soluble group of a solphonium group containing a water-soluble group.
(FR) L'invention concerne une composition de résine chimiquement amplifiée qui élimine les taches lorsqu'elle est utilisée pour produire des dispositifs à semi-conducteurs. Cette composition contient un polymère de base contenant un groupe protégé, un solvant et un générateur d'acide photosensible contenant un sel d'iodonium contenant un groupe hydrosoluble d'un groupe sulphonium contenant un groupe hydrosoluble.
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