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1. (WO2002000955) RAW MATERIAL FOR SHADOW MASK FOR COLOR IMAGE RECEIVING TUBE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2002/000955    International Application No.:    PCT/JP2001/005273
Publication Date: 03.01.2002 International Filing Date: 20.06.2001
Chapter 2 Demand Filed:    23.01.2002    
IPC:
C22C 38/00 (2006.01), C22C 38/04 (2006.01), C22C 38/20 (2006.01), H01J 29/07 (2006.01)
Applicants: TOYO KOHAN CO.,LTD. [JP/JP]; 2-12, Yonbancho Chiyoda-ku, Tokyo 102-8447 (JP) (For All Designated States Except US).
AOKI, Shinichi [JP/JP]; (JP) (For US Only).
UEDA, Toshiyuki [JP/JP]; (JP) (For US Only).
YABUTA, Naomi [JP/JP]; (JP) (For US Only).
FUKUMOTO, Masahiro [JP/JP]; (JP) (For US Only).
AGARI, Jun [JP/JP]; (JP) (For US Only)
Inventors: AOKI, Shinichi; (JP).
UEDA, Toshiyuki; (JP).
YABUTA, Naomi; (JP).
FUKUMOTO, Masahiro; (JP).
AGARI, Jun; (JP)
Agent: OHTA, Akio; Ohta Patent Office New State Manor Bldg. 356 23-1, Yoyogi 2-chome Shibuya-ku, Tokyo 151-0053 (JP)
Priority Data:
2000-191716 26.06.2000 JP
Title (EN) RAW MATERIAL FOR SHADOW MASK FOR COLOR IMAGE RECEIVING TUBE
(FR) MATERIAU CONSTITUTIF D'UN MASQUE PERFORE POUR TUBE IMAGE
Abstract: front page image
(EN)A raw material for a shadow mask for a color image receiving tube, characterized in that it comprises a low carbon steel containing 0.60 wt % of Mn and 0.002 to 0.012 wt % of Al; a shadow mask, characterized in that it uses the raw material; and a color image receiving tube, characterized in that it has the shadow mask incorporated therein. The raw material is excellent in tensile strength and high temperature creep strength.
(FR)L'invention porte: sur un matériau constitutif de masque perforé pour tube image consistant en un acier à faible teneur en carbone contenant 0,60 % en poids de Mn et de 0,002 à 0,012 % en poids d'Al; sur un masque perforé en étant fait; et sur un tube image muni dudit masque. Ledit matériau est excellent pour ce qui est de la résistance à la traction et de la résistance au fluage à haute température.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)