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Machine translation
1. (WO2001088972) PROCESS FOR PRODUCING INTEGRATED CIRCUITS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/088972    International Application No.:    PCT/FI2001/000473
Publication Date: 22.11.2001 International Filing Date: 15.05.2001
Chapter 2 Demand Filed:    27.11.2001    
IPC:
H01L 21/285 (2006.01), H01L 21/3105 (2006.01), H01L 21/768 (2006.01)
Applicants: ASM MICROCHEMISTRY OY [FI/FI]; Kutojantie 2 B FIN-02630 Espoo (FI) (For All Designated States Except US).
SOININEN, Pekka, Juha [FI/FI]; (FI) (For US Only).
ELERS, Kai-Erik [FI/FI]; (FI) (For US Only)
Inventors: SOININEN, Pekka, Juha; (FI).
ELERS, Kai-Erik; (FI)
Agent: SEPPO LAINE OY; Itämerenkatu 3 B FIN-00180 Helsinki (FI)
Priority Data:
20001163 15.05.2000 FI
Title (EN) PROCESS FOR PRODUCING INTEGRATED CIRCUITS
(FR) PROCEDE D'ELABORATION DE CIRCUITS INTEGRES
Abstract: front page image
(EN)This invention concerns a process for producing integrated circuits containing at least one layer of elemental metal which during the processing of the integrated circuit is at least partly in the form of metal oxide, and the use of an organic compound containing certain functional groups for the reduction of a metal oxide layer formed during the production of an integrated circuit. According to the present process the metal oxide layer is at least partly reduced to elemental metal with a reducing agent selected from organic compounds containing one or more of the following functional groups: alcohol (-OH), aldehyde (-CHO), and carboxylic acid (-COOH).
(FR)L'invention porte sur un procédé d'élaboration de circuits intégrés comportant au moins une couche de métal élémentaire au moins partiellement sous forme d'oxyde métallique pendant le traitement d'un circuit, et l'utilisation d'un composé organique présentant certains groupes fonctionnels et servant à réduire la couche d'oxyde métallique formée pendant l'élaboration du circuit. Selon ledit procédé la couche d'oxyde métallique est au moins partiellement ramenée à l'état de métal élémentaire par un agent réducteur choisi parmi des composés organiques comportant un ou plusieurs des groupes fonctionnels suivants: alcool (-OH), aldéhyde (-CHO), et acide carboxylique (-COOH).
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)