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Machine translation
1. (WO2001081645) MICROSTRUCTURE CONTROLLED SHEAR BAND PATTERN FORMATION IN DUCTILE METAL/BULK METALLIC GLASS MATRIX COMPOSITES PREPARED BY SLR PROCESSING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/081645    International Application No.:    PCT/US2001/013191
Publication Date: 01.11.2001 International Filing Date: 24.04.2001
Chapter 2 Demand Filed:    19.11.2001    
IPC:
B22F 3/00 (2006.01), B22F 9/00 (2006.01), C22C 33/00 (2006.01), C22C 45/00 (2006.01), C22C 45/10 (2006.01)
Applicants: CALIFORNIA INSTITUTE OF TECHNOLOGY [US/US]; 1200 East California Boulevard Mail Code 201-85 Pasadena, CA 91125 (US) (For All Designated States Except US).
HAYS, Charles, C. [US/US]; (US) (For US Only)
Inventors: HAYS, Charles, C.; (US)
Agent: HARRIS, Scott, C.; Fish & Richardson P.C. 4350 La Jolla Village Drive, Suite 500 San Diego, CA 92122 (US)
Priority Data:
60/199,219 24.04.2000 US
Title (EN) MICROSTRUCTURE CONTROLLED SHEAR BAND PATTERN FORMATION IN DUCTILE METAL/BULK METALLIC GLASS MATRIX COMPOSITES PREPARED BY SLR PROCESSING
(FR) FORMATION DE MOTIFS DE BANDE DE CISAILLEMENT CONTROLEE PAR MICROSTRUCTURE DANS DES COMPOSITES DE METAL DUCTILE / MATRICE VITREUSE METALLIQUE EN MASSE, PREPARES PAR TRAITEMENT SLR (REGION LIQUIDE SURFONDUE)
Abstract: front page image
(EN)A new metallic glass is formed by adding special additives to a metallic glass matrix; the additives having ductile properties to form as dendrites in the metallic glass. The additives distribute the shear lines in the metallic glass, allowing it to plastically deform more than previous materials.
(FR)L'invention concerne un nouveau verre métallique que l'on obtient en ajoutant des additifs spéciaux à une matrice vitreuse métallique. Ces additifs possèdent des propriétés ductiles permettant de former des dendrites dans le verre métallique. Les additifs permettent de distribuer les lignes de cisaillement dans le verre métallique, lui permettant une déformation plastique supérieure à celle des matériaux précédents.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)