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1. (WO2001080668) A PROCESS AND APPARATUS FOR REDUCTION OF MICROORGANISMS IN A CONDUCTIVE MEDIUM USING LOW VOLTAGE PULSED ELECTRICAL ENERGY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/080668    International Application No.:    PCT/US2001/009949
Publication Date: 01.11.2001 International Filing Date: 28.03.2001
Chapter 2 Demand Filed:    26.11.2001    
IPC:
A23C 3/00 (2006.01), A23L 2/02 (2006.01), A23L 2/48 (2006.01), A23L 3/005 (2006.01), A23L 3/32 (2006.01)
Applicants: ROBBINS, John, A. [US/US]; (US)
Inventors: ROBBINS, John, A.; (US)
Agent: CHEEK, Warren, M., Jr.; Wenderoth, Lind & Ponack, L.L.P. Suite 800 2033 K Street, N.W. Washington, DC 20006-1021 (US)
Priority Data:
09/557,963 25.04.2000 US
Title (EN) A PROCESS AND APPARATUS FOR REDUCTION OF MICROORGANISMS IN A CONDUCTIVE MEDIUM USING LOW VOLTAGE PULSED ELECTRICAL ENERGY
(FR) PROCEDE ET APPAREIL PERMETTANT DE REDUIRE LA TAILLE DE MICRO-ORGANISMES DANS UN SUPPORT CONDUCTEUR AU MOYEN D'UNE ENERGIE ELECTRIQUE IMPULSIONNELLE DE FAIBLE TENSION
Abstract: front page image
(EN)A process and apparatus are provided for reducing microorganisms in a conductive medium using a low voltage pulsed electrical energy.
(FR)L'invention concerne un procédé et un appareil permettant de réduire la taille de micro-organismes dans un support conducteur au moyen d'une énergie électrique impulsionnelle de faible tension.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)