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1. WO2001055767 - MICROLITHOGRAPHIC REDUCTION PROJECTION CATADIOPTRIC OBJECTIVE

Publication Number WO/2001/055767
Publication Date 02.08.2001
International Application No. PCT/EP2000/013257
International Filing Date 23.12.2000
Chapter 2 Demand Filed 13.08.2001
IPC
G02B 17/08 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02B 13/22
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13Optical objectives specially designed for the purposes specified below
22Telecentric objectives or lens systems
G02B 17/0828
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
082using three curved mirrors
0828off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
G02B 17/0844
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0836using more than three curved mirrors
0844off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
G02B 17/0848
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0836using more than three curved mirrors
0848off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
G02B 17/0892
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0892specially adapted for the UV
G03F 7/70225
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70225Catadioptric systems, i.e. documents describing optical design aspect details
Applicants
  • CARL ZEISS [DE]/[DE] (AT, BE, CH, CY, DE, DK, ES, FI, FR, GR, IT, LU, MC, NL, PT, SE, TR)
  • CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS [DE]/[DE] (GB, IE, JP, KR)
Inventors
  • SHAFER, David, R.
Priority Data
60/176,19014.01.2000US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) MICROLITHOGRAPHIC REDUCTION PROJECTION CATADIOPTRIC OBJECTIVE
(FR) OBJECTIF CATADIOPTRIQUE DE PROJECTION DE REDUCTION MICROLITHOGRAPHIQUE
Abstract
(EN) Microlithographic reduction projection catadioptric objective, which is devoid of planar folding mirrors and which comprises an aperture plane (stop) on the image side of the most imageward curved mirror (M34). After the most imageward curved mirror (M34) the beam is diverging. The most imageward curved mirror (M34) is convex. The objective consists in sequence from the object side (Ob) to the image side (Im) of a catadioptric group (L31-L35, M31, M32) giving a real intermediate image (Imi), a catoptric or catadioptric group (M33, M34) giving a virtual image, and a dioptric group (FLG') giving a real image.
(FR) L'invention concerne un objectif catadioptrique de projection de réduction microlithographique ne possédant pas de miroirs pliables plans mais une surface d'ouverture (arrêt) du côté image du miroir convexe le plus incurvé vers l'image (M34). Après ce dernier, le faisceau diverge. L'objectif est constitué, dans l'ordre, du côté objet (Ob) au côté image (Im), d'un groupe catadioptrique (L31, L35, M31, M32) produisant une image intermédiaire réelle (Imi), un groupe catoptrique ou catadioptrique (M33, M34) produisant une image virtuelle, et un groupe dioptrique (FLG') produisant une image réelle.
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