Processing

Please wait...

Settings

Settings

Goto Application

1. WO2001055760 - METHOD FOR PRODUCING A GRID STRUCTURE, AN OPTICAL ELEMENT, AN EVANESCENCE FIELD SENSOR PLATE, A MICROTITRE PLATE AND AN OPTICAL COMMUNICATION ENGINEERING COUPLER AS WELL AS A DEVICE FOR MONITORING A WAVELENGTH

Publication Number WO/2001/055760
Publication Date 02.08.2001
International Application No. PCT/CH2001/000060
International Filing Date 26.01.2001
Chapter 2 Demand Filed 30.07.2001
IPC
G01N 21/64 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
63optically excited
64Fluorescence; Phosphorescence
G01N 21/552 2014.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
55Specular reflectivity
552Attenuated total reflection
G01N 21/77 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
75Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
77by observing the effect on a chemical indicator
G01N 33/53 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
33Investigating or analysing materials by specific methods not covered by groups G01N1/-G01N31/131
48Biological material, e.g. blood, urine; Haemocytometers
50Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
53Immunoassay; Biospecific binding assay; Materials therefor
G01N 37/00 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
37Details not covered by any other group of this subclass
G02B 5/18 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
18Diffracting gratings
CPC
G01N 2021/7776
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
75Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
77by observing the effect on a chemical indicator
7769Measurement method of reaction-produced change in sensor
7776Index
G01N 21/552
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
55Specular reflectivity
552Attenuated total reflection
G01N 21/648
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
63optically excited
64Fluorescence; Phosphorescence
645Specially adapted constructive features of fluorimeters
648using evanescent coupling or surface plasmon coupling for the excitation of fluorescence
G01N 21/7703
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
75Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
77by observing the effect on a chemical indicator
7703using reagent-clad optical fibres or optical waveguides
G01N 21/7743
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
75Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
77by observing the effect on a chemical indicator
7703using reagent-clad optical fibres or optical waveguides
774the reagent being on a grating or periodic structure
7743the reagent-coated grating coupling light in or out of the waveguide
G02B 2006/12107
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
6Light guides
10of the optical waveguide type
12of the integrated circuit kind
12083Constructional arrangements
12107Grating
Applicants
  • UNAXIS BALZERS AKTIENGESELLSCHAFT [LI]/[LI] (AllExceptUS)
  • MAISENHÖLDER, Bernd [DE]/[CH] (UsOnly)
  • EDLINGER, Johannes [AT]/[AT] (UsOnly)
  • HEINE, Claus [DE]/[CH] (UsOnly)
  • PAWLAK, Michael [DE]/[DE] (UsOnly)
  • DUVENECK, Gert [DE]/[DE] (UsOnly)
Inventors
  • MAISENHÖLDER, Bernd
  • EDLINGER, Johannes
  • HEINE, Claus
  • PAWLAK, Michael
  • DUVENECK, Gert
Agents
  • WAGNER, Wolfgang, H.
Priority Data
160/0027.01.2000CH
Publication Language German (de)
Filing Language German (DE)
Designated States
Title
(DE) VERFAHREN ZUR HERSTELLUNG EINER GITTERSTRUKTUR, OPTISCHES ELEMENT, EVANESZENTFELDSENSORPLATTE, MIKROTITERPLATTE UND NACHRICHTENTECHNISCHER OPTISCHER KOPPLER SOWIE VORRICHTUNG ZUR ÜBERWACHUNG EINER WELLENLÄNGE
(EN) METHOD FOR PRODUCING A GRID STRUCTURE, AN OPTICAL ELEMENT, AN EVANESCENCE FIELD SENSOR PLATE, A MICROTITRE PLATE AND AN OPTICAL COMMUNICATION ENGINEERING COUPLER AS WELL AS A DEVICE FOR MONITORING A WAVELENGTH
(FR) PROCEDE DE REALISATION D'UNE STRUCTURE RETICULAIRE, ELEMENT OPTIQUE, PLAQUE DE DETECTION A CHAMP EVANESCENT, PLAQUE A MICROTITRATION, COUPLEUR OPTIQUE UTILISE DANS LA TECHNIQUE DE COMMUNICATION, ET DISPOSITIF POUR SURVEILLER UNE LONGUEUR D'ONDE
Abstract
(DE) Zur Herstellung eines als Liniengitter mit einer Gitterperiode zwischen 100 nm und 2'500 nm ausgebildeten Koppelgitters wird ein Substrat (1) mit einer Photolackschicht (10) bedeckt und mittels einer Quecksilberdampflampe (11) über einen Umlenkspiegel (13, 13') durch eine Phasenmaske (14), in deren Nahfeld sie angeordnet ist, etwa unter dem Lithrow-Winkel ($g(U)L) oder unter 0° belichtet, dann durch reaktives Ionenätzen strukturiert und durch reaktives DC-Magnetron-Sputtern, insbesondere gepulstes DC-Sputtern oder AC-überlagertes DC-Sputtern mit einer transparenten Schicht versehen. Die Phasenmaske (14) wird vorgängig im Laser-Zweistrahlinterferenzverfahren strukturiert. Da sehr präzise Gitter auch grosser Abmessungen hergestellt werden können, eignet sich das Verfahren zur Herstelllung optischer Elemente, insbesondere Evaneszentfeldsensorplatten und optischer Koppler für die Nachrichtentechnik, die insbesondere als Filter für das Wellenlängen-Multiplexen in Glasfasernetzen eingesetzt werden können.
(EN) The aim of the invention is to produce a coupling grid that is designed as a line grid having a grid period between 100 nm and 2,500 nm. A substrate (1) is covered with a photosensitive resist layer (10) and is exposed by means of a mercury discharge lamp (11) via a deviation mirror (13, 13') and through a phase mask (14) and approximately under the Littrow angle ($g(U)L) or 0°. Said layer is arranged in the near field of the phase mask. Said substrate is then structured by means of reactive ion etching and is provided with a transparent layer by means of reactive DC magnetron sputtering, especially pulsed DC sputtering or AC superimposed DC sputtering. The phase mask (14) has previously been structured according to the laser two beam interference method. The inventive method is suitable for producing optical elements, especially evanescence field sensor plates and optical couplers for communication engineering, as very precise grids even having great dimensions can be produced. Said optical elements can be especially used as filters for wavelength multiplexing in optical fibre networks.
(FR) Selon l'invention, pour réaliser un réseau de couplage se présentant sous la forme d'un réseau de lignes dont la période de réseau est comprise en 100 mm et 2500 mm, on recouvre un substrat (1) avec une couche de photorésist (10) et on expose ledit substrat à une lumière au moyen d'une lampe à arc à mercure (11), par l'intermédiaire d'un miroir de déviation (13, 13'), la lumière passant à travers un masque de phase (14) dans le champ proche duquel se trouve ladite couche, cela sous l'angle de Littrow ($g(U)L) ou à un angle de 0°. Cette couche est ensuite structurée par attaque ionique réactive et pourvue d'une couche transparente par pulvérisation au magnétron à courant continu réactive, en particulier par pulvérisation à courant continu pulsée ou par pulvérisation à courant continu avec superposition d'un courant alternatif. Le masque de phase (14) est préalablement structuré selon le procédé d'interférence de deux faisceaux laser. Etant donné que l'on peut réaliser des réseaux précis même de grande dimension, ce procédé peut être mis en oeuvre pour la réalisation d'éléments optiques, en particulier de plaques de détection à champ évanescent et de coupleurs optiques pour la technique de communication, lesquels peuvent être, en particulier, utilisés comme filtres pour le multiplexage en longueur d'onde dans des réseaux à fibres de verre.
Latest bibliographic data on file with the International Bureau