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Machine translation
1. (WO2001037053) IMAGING METHOD USING PHASE BOUNDARY MASKING WITH MODIFIED ILLUMINATION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/037053    International Application No.:    PCT/US2000/031333
Publication Date: 25.05.2001 International Filing Date: 15.11.2000
Chapter 2 Demand Filed:    15.06.2001    
IPC:
G02B 27/46 (2006.01), G03F 1/00 (2012.01), G03F 7/20 (2006.01), H01L 21/027 (2006.01)
Applicants: ASM LITHOGRAPHY B.V. [NL/NL]; P.O. Box 324, NL-5500 AH Veldhoven (NL)
Inventors: SMITH, Bruce, W.; (US).
PETERSON, John, S.; (US)
Agent: BARUFKA, Jack, S.; Pillsbury Winthrop LLP, 1600 Tysons Boulevard, McLean, VA 22102 (US)
Priority Data:
60/165,465 15.11.1999 US
Title (EN) IMAGING METHOD USING PHASE BOUNDARY MASKING WITH MODIFIED ILLUMINATION
(FR) PROCEDE D'IMAGERIE UTILISANT LA MASQUAGE DE LIMITE DE PHASE A ECLAIRAGE MODIFIE
Abstract: front page image
(EN)A projection lithography system (Fig. 8) provides a cross-quadrupole illumination pattern (Fig. 5B) in combination with a translucent substrate (61) having boundary relief features (60). The features are spaced close together so that they are not imaged in a focal plane, but generate a dark image of the space between the features in the focal plane.
(FR)L'invention concerne un système de lithogravure par projection (fig. 8) qui produit un motif d'éclairage quadrupôle transversal en combinaison avec un substrat (61) translucide présentant des caractéristiques (60) de relief périphériques. Ces caractéristiques, très près les unes des autres, ne forment pas d'image dans un plan focal, mais produisent une image sombre de l'espace entre elles dans le plan focal.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)