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1. (WO2001037053) IMAGING METHOD USING PHASE BOUNDARY MASKING WITH MODIFIED ILLUMINATION

Pub. No.:    WO/2001/037053    International Application No.:    PCT/US2000/031333
Publication Date: Sat May 26 01:59:59 CEST 2001 International Filing Date: Thu Nov 16 00:59:59 CET 2000
IPC: G02B 27/46
G03F 1/00
G03F 7/20
H01L 21/027
Applicants: ASM LITHOGRAPHY B.V.
Inventors: SMITH, Bruce, W.
PETERSON, John, S.
Title: IMAGING METHOD USING PHASE BOUNDARY MASKING WITH MODIFIED ILLUMINATION
Abstract:
A projection lithography system (Fig. 8) provides a cross-quadrupole illumination pattern (Fig. 5B) in combination with a translucent substrate (61) having boundary relief features (60). The features are spaced close together so that they are not imaged in a focal plane, but generate a dark image of the space between the features in the focal plane.