WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2001036701) HIGH TARGET UTILIZATION MAGNETIC ARRANGEMENT FOR A TRUNCATED CONICAL SPUTTERING TARGET
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2001/036701 International Application No.: PCT/US2000/030793
Publication Date: 25.05.2001 International Filing Date: 10.11.2000
IPC:
C23C 14/35 (2006.01) ,H01J 37/34 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
35
by application of a magnetic field, e.g. magnetron sputtering
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
34
operating with cathodic sputtering
Applicants: RUSSELL, Derrek, Andrew[US/US]; US (UsOnly)
TOKYO ELECTRON LIMITED[JP/JP]; TBS Broadcast Center 3-6, Akasaka 5-chome Minato-ku Tokyo 107, JP (AllExceptUS)
TOKYO ELECTRON ARIZONA, INC.[US/US]; 2120 W. Guadalupe Road Gilbert, AZ 85233-8205, US (JP)
Inventors: RUSSELL, Derrek, Andrew; US
Agent: FREI, Donald, F. ; Wood, Herron & Evans, L.L.P. 2700 Carew Tower Cincinnati, OH 45202, US
Priority Data:
09/442,60018.11.1999US
09/688,70917.10.2000US
Title (EN) HIGH TARGET UTILIZATION MAGNETIC ARRANGEMENT FOR A TRUNCATED CONICAL SPUTTERING TARGET
(FR) DISPOSITIF MAGNETIQUE RENFORÇANT L'UTILISATION D'UNE CIBLE TRONCONIQUE DE PULVERISATION CATHODIQUE
Abstract:
(EN) Magnetron sputter coating system has magnetron cathode (20) that includes frusto-conical target (25) having cone-shaped magnet assembly (30) that causes erosion rate to be highest under main magnetic tunnel at intermediate radius or centerline of target (25) when the target (25) is uneroded, with location of highest erosion rate gradually shifting to two areas as target erodes, one being inner area at radii less than that of target centerline and one being outer area at radii greater than target centerline. As a result, target erosion tends to be equalized over target area during life of target (25), improving target utilization. Magnet assembly (30) includes inner ring (31) and outer ring (33) having poles magnetically connected by a yoke (36), forming main magnetic tunnel, and intermediate magnet ring (32) oriented to produce field opposite to orientation of poles producing main magnetic tunnel.
(FR) L'invention porte sur un système de pulvérisation cathodique à magnétron dans lequel la cathode (20) du magnétron comporte une cible (25) tronconique munie d'un aimant (30) conique rendant le taux d'érosion plus élevé sous le tunnel magnétique principal au niveau du rayon intermédiaire ou de l'axe de la cible (25) à l'état non érodé, la zone de plus forte érosion se décalant progressivement pendant l'érosion vers deux zones: l'une, intérieure, correspondant à des rayons inférieurs à celui de l'axe de la cible, et l'autre, extérieure, correspondant à des rayons supérieurs à celui de l'axe de la cible. Il en résulte que l'érosion de la cible (25) tend à se répartir uniformément sur toute sa surface pendant sa durée de vie, ce qui en améliore l'utilisation. L'aimant (30) comporte un anneau intérieur (31), un anneau extérieur (33) présentant des pôles reliés magnétiquement par une armature (36) formant le tunnel magnétique principal, et un anneau intermédiaire (32) orienté de manière à produire un champ opposé à l'orientation des pôles produisant le tunnel magnétique principal.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)